Film photoetching manufacturing method of plasma display plate electrode and its product
A plasma and manufacturing method technology, applied in the direction of electrode system manufacturing, discharge tube/lamp manufacturing, cold cathode manufacturing, etc., can solve problems such as electrode line defects, defect point multiplication, bubble amplification, etc., to achieve manufacturing difficulty and low cost , reduce defects and improve quality
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[0034] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.
[0035] A thin-film photolithographic manufacturing method for electrodes of a plasma display panel, comprising a front substrate electrode group and a rear substrate electrode group, which are all sequentially manufactured by the following steps:
[0036] (1) Evaporation of thin film electrodes; the process conditions and work steps of this step are the same as those of the prior art;
[0037] (2) coating of photosensitive material (adopting dry film hot pressing to carry out); The technological condition of this step and work step are identical with prior art, and dry film hot pressing wherein is meant that photosensitive material is made into the dry film of uniform thickness, Then place the dry film between the substrate and the hot pressing roller, and make the substrate pass through the hot pressing roller to press the dry film on the substrate;
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