Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Photocurable acrylate composition

a technology of acrylate and composition, applied in the field of photocuring technology, can solve the problems of low photoenergetic activity, high defective rate of liquid crystal panels, low thermal stability, etc., and achieve the effects of good storage stability, high sensitivity, and good adaptability

Active Publication Date: 2016-07-05
CHANGZHOU TRONLY ADVANCED ELECTRONICS MATERIALS CO LTD
View PDF10 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0005]With respect to the deficiencies in prior art, an object of this present disclosure is to provide a photocurable acrylate composition, containing a compound of formula (I) as a photoinitiator and components of an acrylate monomer and a polymer adapted to the photoinitiator. Upon photopolymerization, this photocurable composition has high curing speed, low pollution, low energy consumption, high exposure efficiency, small exposure dose, fine and integral of image patterns cure-molded, no defect and scum, and and good film hardness.
[0032]In the photocurable acrylate composition described in this disclosure, the compound of formula (I) as a photoinitiator has a good adaptability to the selected components (A) and (B). By the combination of these components, the composition obtained has very good storage stability and remarkably high sensitivity at a short wavelength, may be cross-linked and cured at a very low exposure dose, and has an extremely good curing effect. The film made from the composition has a smooth edge, no defect and scum, and good integrity throughout the whole pattern, and is a high-hardness resist film, and an optical filter made therefrom has high optical transparency and no light leakage. In particular, when producing black matrices (BMs) in color filters, due to the presence of black pigment or dye, the utilization effect of light source is extremely poor, whereas the production of BMs still may be completed at a very low exposure dose by using this composition, and the BMs produced have high light-shielding property as well as excellent precision, evenness, and durability. Meanwhile, the composition of this disclosure is also an excellent material for producing photospacers.

Problems solved by technology

It is practically demonstrated that conventional acrylate compositions generally have drawbacks such as poor solubility, low thermal stability, low photosensing activity, etc., and are incompletely photocurable, resulting in high defective rate of liquid crystal panels, high pollution of production streamline, and increased production cost.
These factors do not allow them to meet the needs of industry development.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0033]Hereafter, this disclosure will be further illustrated by Examples, but it is not to be understood that the scope of this disclosure is limited thereto.

[0034]The techniques for producing RGBs, BMs, and photospacers using photocurable acrylate compositions by the processes of photocuring and lithography have been well known to the skilled person in the art, and typically comprise the steps of:

[0035]i) dissolving a photocurable composition in a suitable organic solvent (for example propylene glycol monomethyl ether acetate and / or ethyl 2-hydroxypropionate) to obtain a liquid-like composition;

[0036]ii) uniformly coating the liquid-like composition on a substrate using a coater, for example a spin coater, a wire bar coater, a roll coater, a spray coater, etc.,

[0037]iii) performing prebaking for drying to remove the solvent;

[0038]iv) attaching a mask plate onto a sample to perform exposure, and subsequently developing to remove the unexposed regions; and

[0039]v) performing postbaki...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
wavelengthaaaaaaaaaa
temperatureaaaaaaaaaa
Login to View More

Abstract

A photocurable acrylate composition, containing a compound of formula (I) as a photoinitiator and the components adapted to the photoinitiator. The photocurable composition has very good storage stability and very high light sensitivity, can be cross-linked and cured at a very low exposure dose, and has a very good curing effect; a film made from the composition has a smooth edge, no defect and scum, and good integrity throughout the whole pattern, and is a high-hardness resist film, and an optical filter made therefrom has high optical transparency and no light leakage.

Description

FIELD OF THE DISCLOSURE[0001]This present disclosure belongs to the field of the photocuring technology, and specifically relates to a photocurable acrylate composition and its application in liquid crystal display apparatuses such as a color filter and a photospacer.BACKGROUND OF THE DISCLOSURE[0002]As a key member in a liquid crystal display apparatus, a color filter consists of various pixel materials such as red (R), green (G), blue (B), black, and the like, wherein the black is made to be matrix-like to separate R, G, and B to prevent cross-color (i.e., a black matrix, BM). In a liquid crystal display, in order to maintain the thickness between a color filter substrate and a thin-film transistor, spherical particles made of glass or resin referred to as spacers (photospacers) are dispersed inside a box.[0003]Photocurable acrylate compositions have been widely used for preparing RGBs, BMs, and photospacers. At present, related reports have been made by a number of patent documen...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(United States)
IPC IPC(8): C08F2/46G03F7/00G02F1/1339G03F7/033G03F7/031G02B1/10G02B1/04C08G61/04C08F2/50G02F1/1335
CPCG02B1/04G02B1/10G02F1/13392G02F1/133514G03F7/0007G03F7/031G03F7/033G02F1/133516G02F2001/13398G02F2202/023G02B1/105G02B1/14G02F1/13398C08L33/064C08L33/10C08L33/08C08L67/06
Inventor QIAN, XIAOCHUN
Owner CHANGZHOU TRONLY ADVANCED ELECTRONICS MATERIALS CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products