Organic electric memory device based on phosphonic acid or trichlorosilane-modified ITO glass substrate and preparation method thereof
a technology of organic electric memory and phosphonic acid, which is applied in the field of preparation of organic electric memory devices based on phosphonic acid or trichlorosilanemodified ito glass substrates, can solve the problems of increasing the number of binary storage devices, scientists are no longer satisfied with binary storage devices, and traditional information storage is gradually showing a situation that cannot meet the growing demand, so as to achieve high potential value for memory application and high yield of ternary memory
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example 1
on of Organic Electric Memory Devices Based on Phosphonic Acid-Modified ITO Glass Substrate
[0027]As shown in FIG. 1A, the device is divided into three layers that are the phosphoric acid-modified ITO substrate, organic film and aluminum electrode from up to below. The specific preparation process is as follows:
[0028]1. Cleaning ITO substrate with deionized water, ethanol, and acetone in the ultrasonic, respectively.
[0029]2. ITO substrate is modified with phenylphosphonic acid by a tethered method, then placed in ethanol with ultrasonic treatment for 30 min, and annealed for 6 h in 65° C. vacuum oven in nitrogen atmosphere. The dried ITO glass is sonicated again for 30 minutes separately in ethanol, a 5% trimethylamine / ethanol solution, ethanol, to form a modified layer, whose thickness is of a monolayer of phosphonic acid molecule.
[0030]3. Evaporating the organic coating material of 2-(4-butylphenylamino)-4-4-butylphenylimino)-3-oxo-1-cyclobutenol inner salt on the modified layer, u...
example 2
on of Organic Electric Memory Devices Based on Trichlorosilane-Modified ITO Glass Substrate
[0034]As shown in FIG. 1B, the device is divided into three layers that are the trichlorosilane-modified ITO substrate, organic coating layer, and aluminum electrode. The specific preparation process is as follows:
[0035]1. ITO substrate is cleaned with deionized water, ethanol, and acetone in the ultrasonic, respectively.
[0036]2. 0.01 mmol / L solution of trichlorosilane in toluene is spun onto ITO glass substrate at 2000 rpm in a glove box with a moisture content of less than 20 ppm. Then placed in nitrogen atmosphere for 6 h in vacuum oven at 70° C.
[0037]3. The organic molecules of 2-(4-butylphenylamino)-4-4-butylphenylimino)-3-oxo-1-cyclobutenol inner salt is evaporated on the modified substrates, until the thickness reaches 100 nm to form the coating layer. The deposition rate is 2 A / s under 5×10−4 Pa vacuum condition.
[0038]4. The aluminum electrode is deposited at 2 A / s on the organic film,...
example 3
Ternary Turn-on Voltage and Yield of Memory Devices with Different Modification Layer
[0041]Place the device in a 4200-SCS semiconductor analyzer. Adjust the voltage from −5V to 5V and measure the change of the resistance of the device at room temperature.
[0042]The test data of different devices are counted and the average turn-on voltages are calculated. The results are shown in FIG. 4. The result shows that turn-on voltage of the modified device is decreased and the turn-on voltage of the device modified by octylphosphonic acid is the lowest. The reduction of the turn-on voltage is advantageous for reducing the energy consumption.
[0043]The test data of the different devices are counted and the ternary yield is calculated. The results are shown in FIG. 5. The result shows that the ternary yield of the modified device is improved, and the yield of the device modified with octylphosphonic acid is the highest.
[0044]In summary, with the modification of the ITO substrates, a series of sa...
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