Mask pattern inspecting method, inspection apparatus, inspecting data used therein and inspecting data generating method

Abstract

A method of inspecting a photomask for a semiconductor integrated circuit formed based on drawing pattern data, includes the steps of classifying a drawing pattern of the semiconductor integrated circuit into a plurality of ranks in accordance with a predetermined reference and extracting the same, determining inspecting accuracy for each of the ranks, and deciding quality of the photomask depending on whether the determined inspecting accuracy is satisfied.

Description

[0001] The present application is based on Japanese Patent Application No. 2002-342304, which is incorporated herein by reference. BACKGROUND OF THE INVENTION [0002] 1. Field of the Invention [0003] The present invention relates to a method of inspecting a mask pattern, an inspection apparatus, inspecting data used therein and a method of generating the inspecting data, and more particularly to the extraction and inspection of inspecting accuracy data in a process for inspecting a photomask. [0004] 2. Description of the Related Art [0005] In recent years, a semiconductor integrated circuit device (hereinafter referred to as an LSI) in each product is evaluated as a key device, and an increase in the scale and speed of the LSI has been required in order to maintain the competitiveness of the product. A fine process is necessary with the microfabrication of an element and an increase in integration. [0006] Under the circumstances, process conditions have been increasingly restricted i...

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Benefits of technology

[0035] In consideration of the actual circumstances, the invention has been made and has an object to provide a method of inspecting a photomask which can shorten a TAT and decrease a cost.

[0036] It is another object to provide an apparatus for inspecting a photomask which can shorten the TAT and decrease the cost.

[0037] It is yet another object to provide inspecting data capable of shortening the TAT and decreasing the cost in order to create the photomask.

Problems solved by technology

Even if a mask pattern region is excessively large or small, the accuracy in the etching is reduced.

Moreover, the formation of a diffusion layer also has the same problems.

If an ion implantation region for forming the diffusion layer is too small, the concentration of the ion is generated so that a desirable diffusion profile cannot be obtained.

Consequently, there is a problem in that a time (TAT) required from an order to a completion is increased.

Moreover, the photomask is expensive.

Therefore, a sudden rise in a cost caused by the necessity of a large number of photomask blanks for carrying out the manufacture again is also a serious problem.

In the case in which the pattern density of a wiring layer to be a lower layer is low and there is a region including a pattern having a predetermined area or less, however, the flattening cannot be carried out even if the insulating film is formed thickly.

In the case in which the layout pattern has a deviation, thus, sufficient pattern accuracy for the layer cannot be obtained.

In addition, there is a problem in that the pattern accuracy of an upper layer is also influenced.

Consequently, there is a problem in that the process accuracy cannot be sufficiently obtained.

Therefore, it is decided that the defect 202 having such a size as not to make troubles is also a defect at the inspecting step.

Therefore, the inspection is executed with unnecessary accuracy so that a correction frequency is increased.

Consequently, there is an obvious problem in that a reduction in a photomask creating period (TAT) and a decrease in the cost of creation are hindered.

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