Ion gun deposition and alignment for liquid-crystal applications
a technology of liquid crystals and aligned atomic structures, applied in the direction of vacuum evaporation coatings, instruments, transportation and packaging, etc., can solve the problems of reducing the process yield, affecting the quality of the rubbing process, and the choice of materials suitable for the rubbing process is limited, so as to reduce the potential contamination of the surface, simple and cost-effective, and easy processing
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second embodiment
[0045] In a second embodiment, one or more ion sources can be held in a fixed position while the substrates to be coated with the aligned amorphous film are moved beneath the ion sources. In this embodiment, substrates larger than the ion sources can be processed.
third embodiment
[0046] In a third embodiment, the substrate or substrates to the processed are held stationary whereas the ion sources are moved relative to the substrates. Once again in this embodiment, the movement of the ion sources allows for the processing of substrates that are larger than the ion sources.
fourth embodiment
[0047] In the apparatus either the substrates or the ion sources are capable of movement, but the angle of incidence of the ion sources relative to one another can be the same or different. Thus, the angle of incidence of the ion sources relative to one another can be fixed for the duration of the process or it can be variable, i.e., changed during the processing of the substrates.
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