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Process for preparing high-purity compact profile tungsten products

A product and high-purity technology, applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems that thin-walled tungsten products cannot be prepared, and the structure of tungsten products is not dense.

Inactive Publication Date: 2007-05-16
BEIJING UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
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Problems solved by technology

Since the structure of tungsten products obtained by powder metallurgy is not dense, it is easy to produce pinholes, and limited by the size and shape of the product, it is impossible to prepare thin-walled and complex-shaped tungsten products. Therefore, it is important to develop a new preparation method for high-purity dense tungsten special-shaped products. Practical significance and wide application fields

Method used

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  • Process for preparing high-purity compact profile tungsten products

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0023] Example 1: Preparation of high-purity, high-density tungsten crucible by deposition

[0024] Firstly, a copper imitation body with the same shape as the prepared tungsten crucible is manufactured.

[0025] The surface of the copper imitation body was washed with acetone, dried and placed in the reaction chamber; the air in the reaction chamber was evacuated with Ar and then H 2 ; heating WF 6 Keep it in a gaseous state at about 30°C; heat the reaction chamber to 400°C, and inject H 2 and WF 6 Mixed gas; H 2 The flow rate is 5L / min, WF 6 The flow rate is 5g / min; the gas pressure in the reaction chamber is 1 atmosphere; the reaction time is 240min; 2 Cool to room temperature under protected conditions and take it out; after cutting and polishing the phantom, dissolve it with nitric acid or heat and melt the special-shaped phantom to obtain a tungsten tube. The analysis test results show that the outer diameter of the prepared tungsten tube is the same as that of the...

example 2

[0026] Example 2: Preparation of high-purity, high-density tungsten tube by deposition

[0027] First process and manufacture a copper dummy with the same outer diameter as the required tungsten tube.

[0028] The surface of the copper imitation body was washed with acetone, dried and placed in the reaction chamber; the air in the reaction chamber was evacuated with Ar and then H 2 ; heating WF 6 Keep it in a gaseous state at about 30°C; heat the reaction chamber to 550°C, and inject H 2 and WF 6 Mixed gas; H 2 The flow rate is 1.5L / min, WF 6 The flow rate is 1.5g / min; the gas pressure in the reaction chamber is 1 atmosphere; the reaction time is 90min; 2 Cool to room temperature under protected conditions and take it out; after cutting and polishing the phantom, dissolve it with nitric acid or heat and melt the special-shaped phantom to obtain a tungsten tube. The analysis and test results show that the outer diameter of the prepared tungsten tube is the same as that of...

example 3

[0029] Example 3: Preparation of high-purity, high-density tungsten tube by deposition

[0030] First process and manufacture a copper dummy with the same inner diameter as the required tungsten tube.

[0031] The surface of the copper imitation body was washed with acetone, dried and placed in the reaction chamber; the air in the reaction chamber was evacuated with Ar and then H 2 ; heating WF 6 Keep it in a gaseous state at about 30°C; heat the reaction chamber to 800°C, and inject H 2 and WF 6 Mixed gas; H 2 The flow rate is 1.0L / min, WF 6 The flow rate is 5g / min; the gas pressure in the reaction chamber is 1 atmosphere; the reaction time is 60min; 2 Cool to room temperature under protected conditions and take it out; after cutting and polishing the phantom, dissolve it with nitric acid or heat and melt the special-shaped phantom to obtain a tungsten tube. The analysis test results show that the inner diameter of the prepared tungsten tube is the same as that of the d...

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Abstract

The invention discloses a preparing method of high-purity compact tungsten product in the difficult dissolving manufacturing domain, which is characterized by the following: adopting copper to make the emulating bulk of tungsten product; cleaning the copper emulating bulk through organic solvent; drying to place in the reacting chamber; adopting WF6 and high-purity H2 as sediment reacting gas; sedimenting under normal pressure at 400-800 Deg C; setting the allocating rate of reacting gas at 1-5g / min WF6 corresponding to 1L / min H2; controlling the sedimenting speed V about 0.5-2mm / h; closing gas after sedimenting; aerating H2 continuously to cool to indoor temperature; fetching; cutting; polishing; dissolving through nitrate or heating to fuse the allotype emulating bulk.

Description

technical field [0001] The invention discloses a method for preparing high-purity dense special-shaped tungsten products, which belongs to the field of refractory metal processing. Background technique [0002] The melting point of tungsten is as high as 3410°C, and the density is as high as 19.3g / cm 3 , Tungsten products are widely used in aviation, aerospace, atomic energy and high temperature fields. Due to the high hardness and high brittleness of tungsten, it is difficult to process and shape by general casting and forging technology. The tungsten products currently used are all made by powder metallurgy. Since the structure of tungsten products obtained by powder metallurgy is not dense, it is easy to produce pinholes, and limited by the size and shape of the product, it is impossible to prepare thin-walled and complex-shaped tungsten products. Therefore, it is important to develop a new preparation method for high-purity dense tungsten special-shaped products. pract...

Claims

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Application Information

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IPC IPC(8): C23C16/448C23C16/06C23C16/52C23C16/56
Inventor 周美玲马捷王从曾
Owner BEIJING UNIV OF TECH
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