Copper and nickel preprocessing technology in ion implantation before polymer surface chemical plating
A technology of surface chemistry and ion implantation, applied in the field of nickel pretreatment and ion implantation of copper, can solve the problems of high activation cost of coating metal, waste of precious metals, serious environmental pollution, etc., achieve good appearance, improve bonding strength, and overcome unfavorable factors. Effect
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Embodiment 1
[0014] Embodiment 1: select polytetrafluoroethylene, clean the surface of polytetrafluoroethylene, degrease and remove the dirt attached to the surface; put the prepared polytetrafluoroethylene in the ion implantation equipment, connect the electrodes to polytetrafluoroethylene Vinyl fluoride material is used for ion implantation; the selected ion implantation element is copper, which is the same as the copper material for electroless plating; the implantation parameters are: accelerating voltage 15KV, implantation dose 2.25×10e 17 ions / cm 2 ; Place the injected polytetrafluoroethylene in the electroless plating solution for direct electroless copper plating. The electroless copper plating is a conventional electroless copper plating process in the prior art, omitted.
[0015] Combining the two technologies of ion implantation and electroless plating, ion implantation is used to replace the existing chemical pretreatment process in the sense of electroless plating to complete...
Embodiment 2
[0016] Example 2: polyethylene is selected, the selected ion implantation element is nickel, and the range of implantation parameters is: accelerating voltage 15KV, implantation dose 2.25×10e 17 ions / cm 2 ; Place the injected polyethylene material in the electroless plating solution for direct electroless nickel plating. Others are the same as in Embodiment 1, omitted.
Embodiment 3
[0017] Example 3: The selected ion implantation element is copper, which is different from the material iron in the subsequent electroless plating. The range of implantation parameters is: accelerating voltage is 45KV, implantation dose is 2.3×10e 17 ions / cm 2 ; Place the injected polytetrafluoroethylene in the electroless plating solution for direct electroless iron plating. Others are the same as in Embodiment 1, omitted.
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