Exposure apparatus
An exposure device and a technology to be exposed, which are applied in the direction of photolithography process exposure device, microlithography exposure equipment, optics, etc., can solve the problems of functional pattern overlap accuracy, difficulty in achieving, and increase in mask cost, etc., to eliminate The effect of reducing coincidence accuracy, suppressing cost increase, and improving coincidence accuracy
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[0037] Embodiments of the present invention will be described in detail below with reference to the drawings.
[0038] figure 1 It is a schematic diagram which shows embodiment of the exposure apparatus of this invention. The exposure device 1 exposes a functional pattern on an object to be exposed, and includes a laser light source 2, an exposure optical system 3, a transport device 4, a photographing device 5, a backlight irradiation device 6 as an illumination device, and an optical system control means 7. In addition, the above functional pattern refers to the pattern of the components of the product that are required to perform the original target action. For example, for a color filter, it is a pixel pattern of a black dot matrix or a red, blue, and green color filter. Sheet patterns, and for semiconductor components, wiring patterns or various electrode patterns, etc. In the following description, an example in which a glass substrate for a color filter is used as an ...
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