Water-based diamond polishing liquid and its production
A polishing liquid and diamond micro-powder technology, applied in the field of polishing liquid, can solve the problems of easy sedimentation, large proportion of diamond micro-powder, inconsistent content of diamond micro-powder, etc., and achieve the effect of increasing content, consistent product quality and good stability
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0032] Example 1: Add diamond micropowder with a particle size range of 1000-2000nm into 98% concentrated sulfuric acid, ultrasonically disperse, heat to 200°C and keep it warm for 2 hours, then centrifuge after cooling, wash with deionized water until neutral, 105°C Dry and set aside. Mix 0.2 part of sodium hexametaphosphate, 0.5 part of lithium bentonite, 0.2 part of methanol, 0.1 part of Skane M-8 fungicide (product of Rohm&Haas company), 97 parts of deionized water, add 2 parts of dried diamond powder, and ultrasonically Disperse and adjust the pH value to 10 with sodium carbonate to obtain a polishing solution with a diamond content of 2%.
[0033] The sedimentation value of the above-mentioned polishing liquid was determined to be 9.
Embodiment 2
[0034] Embodiment 2: The heating temperature is increased to 300° C., and the others are the same as in Embodiment 1.
[0035] The sedimentation value of the above-mentioned polishing liquid was measured to be 7.
Embodiment 3
[0036] Embodiment 3: use the diamond micropowder of particle size range 500-1000nm, its processing method is the same as embodiment 1. 0.5 parts of sodium dodecylsulfonate, 0.5 parts of V-15 fumed silica (product of Wacker Company), 0.01 parts of ethylene glycol, 0.1 parts of Skane M-8 fungicide, and Mix 96 parts of deionized water, add 3 parts of dried diamond micropowder, ultrasonically disperse, adjust the pH value to 9 with triethanolamine, and obtain a polishing solution with a diamond content of 3%.
[0037] The sedimentation value of the above-mentioned polishing liquid was determined to be 5.
PUM
Property | Measurement | Unit |
---|---|---|
Particle size | aaaaa | aaaaa |
Particle size | aaaaa | aaaaa |
Particle size | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com