Method and apparatus for forming surface shape, method and apparatus for forming flying surface shape of magnetic head

Abstract

The invention provides a surface shape forming apparatus, comprising: a resist forming means for forming the resist of a prescribed shape to a prescribed surface of an etching object (1), and an etching means for subjecting the prescribed surface of the etching object (1) in which the resist is formed to etching processing, wherein the resist forming means is equipped with a resist sticking means for sticking a resist material to the prescribed surface of the etching object (1), and a laser irradiation means (2) for irradiating the stuck resist material with a laser beam which moves according to a command of a controller to remove a part of the resist material, so as to form the material to the prescribed shape. The surface shape forming apparatus can form the surface shape of the etching object in a short period of time at a low cost and realize high accuracy of the surface shape to be formed.

Description

technical field [0001] The invention relates to a method and device for forming a surface shape, in particular to a method and a device for forming a protective layer and forming a surface shape by etching. Background technique [0002] A magnetic disk drive device (HDD) includes a magnetic head in which a magnetic head element portion for reading and writing data to a magnetic disk is formed. Moreover, in the current magnetic disk drive device, with the high density of recorded data, the magnetic head is required to be as close as possible to the surface of the magnetic disk, that is, the requirement for low floating of the magnetic head is getting higher and higher. [0003] In order to achieve low floating, unevenness of a predetermined shape is formed on the flying surface of the magnetic head by using the air flow flowing in when the magnetic disk rotates to generate appropriate heavy pressure. Moreover, in recent years, the shape of the flying surface has become more ...

AI Technical Summary

Problems solved by technology

[0008] Furthermore, it is necessary to prepare a plurality of reticle lines (masks) with predetermined patterns, thus increasing the manufacturing cost

In addition, in the exposure process, when the protective layer is thicker than the depth of focus of the imaging surface, a sharp end surface of the protective layer cannot be formed after development, and a steep wall angle of the concave-convex portion by etching cannot be formed.

Thus, it is difficult for such a head slider to maintain a stable flying height

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