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Imaging interference photo etching method using two quadrature acousto-optic modulators and photo etching system

An acousto-optic modulator and imaging interference technology, which is applied in the improvement field of imaging interference lithography technology, can solve the problems of low exposure efficiency and unfavorable popularization and application, and achieve the effects of improving exposure efficiency, shortening exposure time, and convenient operation

Inactive Publication Date: 2006-02-08
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology

However, there are too few studies on the specific implementation system and the practical application of the system. Generally, the adjustment of the optical path between exposures is used to achieve three exposures. Image alignment is the key issue that has not been resolved, and the exposure efficiency is not high, which is not conducive to popularization and application.

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  • Imaging interference photo etching method using two quadrature acousto-optic modulators and photo etching system

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Embodiment Construction

[0014] Such as figure 1 As shown, the present invention includes laser 1, acousto-optic modulator 2 and 3, acousto-optic modulator power supply 4, apertured total reflection mirror 5 and 6, electric exposure shutter 7, total reflection mirror 8 and 9, spatial filter beam expander Straighteners 10, 11, 12, mask 13, imaging optical device 14, resist substrate 15, the driving voltage V added to the AOM 2 and 3 at the AOM power supply 4 1 =V 2 = 0, the laser beam emitted by the laser 1 directly passes through the two acousto-optic modulators 2 and 3, and passes through the small holes on the perforated total reflection mirrors 5 and 6, the electric exposure shutter 7 and the spatial filtering beam expansion collimation The device 10 becomes a parallel light beam to illuminate the mask 13 vertically, and the imaging optical device 14 images the pattern on the mask 13 onto the resist substrate 15 to realize the exposure of the low-frequency component of the mask pattern; when V 1 ...

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Abstract

The invention relates to an image interference etching method and the etching system which uses two quartered acoustic-optic modulators and which is characterized in that it uses two quartered acoustic-optic modulators to bend the laser beam from the laser, when the acoustic-optic modulator dose not have the supersonic power, the laser can directly through the acoustic-optic modulator; when the acoustic-optic modulator have the supersonic power, the laser generates a first-order diffraction light witch can provide the illumination of level direction and vertical direction.

Description

technical field [0001] The invention relates to an imaging interference photolithography method and a photolithography system using two orthogonal acousto-optic modulators, and belongs to the improvement of the imaging interference photolithography technology for producing fine patterns. Background technique [0002] Imaging interference lithography is a new technology to improve the resolution of lithography. Its main feature is to use three exposures to expose the low-frequency components of the mask pattern, the high-frequency components in the x direction and the y direction, and optimize the relative exposure intensity. Improve the resolution of lithography and improve the quality of exposure graphics. A general imaging interference lithography system consists of lasers, beam splitters, mirrors, spatial filters, beam expander collimators, masks, imaging optical lenses and resist substrates, literature Xiaolan Chen andS.R.J.Brueck Imaging Interferometric lithography for...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G02B27/00
Inventor 冯伯儒张锦宗德蓉
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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