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High oxidation resistance nanocrystalline-amorphous structured superhard composite film cutting tool and deposition method therefor

An amorphous structure and nanocrystalline technology, applied in the direction of ion implantation plating, metal material coating process, coating, etc., can solve the problem of difficult adhesion, unfavorable tool coating wear resistance, large surface friction coefficient, etc. problem, to achieve the effect of improving service life, reducing cutting force and reducing wear

Inactive Publication Date: 2005-08-17
吴大维
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Reactive magnetron sputtering using TiSi alloy target and TiAl alloy target, resulting in the formation of nanocrystalline nc-TiN / a-Si 3 N 4 Composite film, but unable to generate nc-AlN / a-Si 3 N 4 , when this film is directly coated on the metal cutting tool, the adhesion is not easy to guarantee, and its surface friction coefficient is large, which is not conducive to improving the wear resistance of the tool coating

Method used

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  • High oxidation resistance nanocrystalline-amorphous structured superhard composite film cutting tool and deposition method therefor
  • High oxidation resistance nanocrystalline-amorphous structured superhard composite film cutting tool and deposition method therefor

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Embodiment Construction

[0079] 1. Description of several important technical issues

[0080] ①Application of cylindrical magnetron sputtering target 1

[0081] Nanocrystalline-amorphous structure (nc-TiAlN / a-Si) of two types of functional film materials involved in the present invention 3 N 4 ) superhard film (referred to as superhard film) and aluminum oxide (Al 2 o 3 ), zirconium dioxide (ZrO 2 ) composed of superlattice structure composite oxide films, all of which are insulating films with high resistivity, the sputtering products often adhere to the non-sputtering area of ​​the target surface during deposition, and gradually expand to the sputtering area, causing the target surface to be "poisoned". "Phenomenon, the positive charges are enriched on the insulating film, which will cause arc discharge on the target surface to a certain extent. The light ones will cause the target power supply to work unstable, and the severe ones will even burn the sputtering power supply. The best way to solv...

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Abstract

The present invention is super hard composite antioxidant film in nanometer crystal-amorphous structure for cutter and its depositing process, and especially relates to super hard film in nanometer crystal-amorphous structure and composite oxide film. The composite film on cutter includes successively the adhering transition layer, super hard nanometer crystal-amorphous structure TiAlN / alpha-Si3N4 film, composite oxide film for raising antioxidant performance and self-lubricating film with low friction coefficient. The present invention provides a vacuum chamber with outer target, inner target and ion source and industrial filming process with high production efficiency, high coating quality and low production cost. The present invention is suitable for various kinds of cutters of high speed steel, hard alloy and ceramic and various kinds of molds.

Description

technical field [0001] The invention relates to a superhard composite film tool in the technical field of new materials and a deposition method thereof, in particular to a nanocrystalline-amorphous structure superhard film and a composite oxide film. Background technique [0002] Hard coating of metal knives is considered to be a revolution in the technology of knives. It does not increase the cost too much, but it can greatly improve the service life of the knives. With the rapid development of modern manufacturing industry, there are more and more difficult-to-process materials. Common tool coatings such as titanium nitride (TiN), titanium carbide (TiC) and titanium aluminum nitride (TiAlN) obviously cannot adapt to harsh processing environments. Foreign industrially developed countries have successfully researched many new superhard thin film materials. Among them, S.Carvalho in Portugal and H.D.Mammling in Germany used magnetron sputtering and cathodic arc method to dep...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/34C23C14/35
Inventor 吴大维吴越侠
Owner 吴大维
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