Process for vacuum linear source evaporation coating film and its apparatus

Abstract

The method and the equipment of vacuum linear-source vapor filming relate to the technology of vacuum filming. The equipment of the invention is composed of exact heater, vapor cavity filling liquid, vapor boat with concavo-convex trough, milling arm, narrow slot cover board, baffle resisting pollution, switch baffle, thermoscope and so on. Different materials can be put in the flute, processing the basic-quality vapored, intermingled, braized together. The exact heater of the equipment is placed out of the vacuum system. The invention can guarantee the vapor boat and the materials in the boat be heated with symmetrical temperature, stable vapor speed. This invention can improve not only the efficient utilizing rate of vapor materials, but also the vapor plating quality of the thin film.

Description

technical field [0001] The invention relates to a method for evaporation (sublimation) coating in vacuum, and a device for realizing the method, which is used for a linear evaporation source, and is especially suitable for a thin film preparation process by evaporation (sublimation) at a lower temperature. Background technique [0002] There are many methods of film formation of organic materials, including vacuum evaporation (sublimation) coating method, molecular beam epitaxy method, organic chemical vapor deposition method, sol-gel method, etc. Among them, the vacuum evaporation (sublimation) coating method has the advantages of simple operation, easy control of film thickness, little pollution to the film, and easy doping. [0003] The key to the vacuum evaporation coating method is the evaporation source. Different materials have different requirements for the evaporation source. For some solid powder materials or liquid materials with low melting points, some existing ...

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Problems solved by technology

[0003] The key to the vacuum evaporation coating method is the evaporation source. Different materials have different requirements for the evaporation source. For some solid powder materials or liquid materials with low melting points, some existing evaporation source structures such as general evaporation boats, evaporation heaters, Knud Zeng Boxes, etc., cannot well meet the requirements of high utilization rate of evaporation source, fast evaporation speed, and good film uniformity.

[0004] The heating point source using low-temperature evaporation has the following disadvantages: First, the effective utilization rate of the evaporation material is very low, only a few percent of the evaporation material, and the remaining 90% of the material is difficult to recycle, resulting in huge waste of material

According to relevant reports, the utilization rate of evaporation materials has reached more than 30%, but the device structure is very complicated, and most of the materials are still wasted.

Second, point source evaporation coating also has a film uniformity problem. If the distance between the evaporation source and the evaporated substrate is relatively close, the uniformity of the evaporated film cannot be guaranteed. If the distance is long, the utilization rate of the evaporation material will be lower, and Increase the volume of the device

Third, the heating device of the current vacuum evaporation device is built inside the vacuum system. The heating device not only pollutes the vacuum system, but also greatly increases the burden on the vacuum system. It also has the disadvantages of low temperature uniformity and difficult control

It is known that the current evaporation source has not solved the problem of material co-evaporation and the problem of easy control of material evaporation rate.

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