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Direct writing of optical device in silica-based glass using femtosecond pulse lasers

A pulse and quartz technology, applied in the direction of optical components, laser welding equipment, laser components, etc., can solve the problems of repetition rate compromise

Inactive Publication Date: 2002-08-21
CORNING INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although it is relatively easy to obtain a repetition rate of 100MHz in oscillation mode when the pulse energy is less than 10nJ, when the energy is in the μJ level, the repetition rate is compromised and dropped to the range of several KHz

Method used

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  • Direct writing of optical device in silica-based glass using femtosecond pulse lasers
  • Direct writing of optical device in silica-based glass using femtosecond pulse lasers
  • Direct writing of optical device in silica-based glass using femtosecond pulse lasers

Examples

Experimental program
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Effect test

example 1

[0060] Using a 10× (0.16NA) clear mirror objective lens, the pulse from the titanium: sapphire multipass amplifier is focused into the fused silica glass sample. The duration of the pulse is 60fs, the pulse energy is about 1μJ, and the sample is mounted on a computer-controlled high-precision three-dimensional translation stage. The fused silica sample is translated through the beam focus at a rate of 30 μm / s, forming a waveguide structure in the bulk. Example 2

example 2

[0061] An 830nm laser is used to provide 40fs pulses with a repetition rate of 1kHz, and the unit pulse energy is about 1-5μJ. A lens with a numerical aperture of 0.16 in air is used to focus the beam into the glass below the surface. The sample is under the beam at about 5-100μm / s moving at a rate of . Keeping the experimental conditions unchanged, for fused silica and 14wt.%GeO 2 -86wt.% SiO 2 Sample exposure. The beam is focused approximately 1 μm below the glass surface. For samples irradiated under the same exposure conditions, the diameter of the germanium oxide-quartz sample affected by laser light is twice that of the fused silica sample. From this result, it was confirmed that the germania-quartz material is more sensitive than fused silica to changes in the refractive index caused by ultrafast laser exposure. Example 3

example 3

[0062]Axial scribing uses focused laser radiation to expose substrates of various glass compositions, i.e. SiO 2 (Corning product 7980) (22wt.%GeO 2 -78wt.% SiO 2 and 9 wt.% B 2 o 3 -91wt.% SiO 2 ). The laser wavelength is 830nm, the pulse duration is 40fs, the unit pulse energy is 1.0μJ, the repetition frequency is 1KHz, and the scanning speed is 20μm / s. After exposure, according to the far-field pattern generated by the waveguide, the refractive index change at 633nm was estimated, and the results are listed in Table 1. The annealing point for each material is also listed in Table 1.

[0063] Glass composition (% by weight)

[0064] Axial inscription with focused laser radiation on 9wt.% B 2 o 3 -91wt.% SiO 2 Exposure of glass samples. The laser wavelength is 830nm, the pulse duration is 40fs, the unit pulse energy is 1.0μJ, the repetition frequency is 1KHz, and the scan rate is 20μm / s. The far-field patterned micrograph of this sample is shown in Figu...

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Abstract

The invention relates to methods of writing a light-guiding structure in a bulk glass substrate. The bulk glass substrate is preferably made from a soft silica-based material having an annealing point less than about 1380 DEG K. A pulsed laser beam is focused within the substrate while the focus is translated relative to the substrate along a scan path at a scan speed effective to induce an increase in the refractive index of the material along the scan path. Substantially no laser-induced physical damage of the material is incurred along the scan path. Various optical devices can be made using this method.

Description

[0001] Cross References to Related Applications [0002] This application claims priority to U.S. Provisional Patent Application Serial No. 60 / 146,274, filed July 29, 1999, entitled "Direct Writing of Optical Devices In Silica-Based Glass Using Femtosecond Pulse Lasers," by Nicholas F. Borrelli and Charlene Smith, and U.S. Provisional Patent Application Serial No. 60 / 172,122, filed December 17, 1999, entitled "Femtosecond Laser Writing of Glass Including Borosilicate, Sulfide and LeadGlasses," inventors Nicholas F. Borrell, David L. Morse, Alesander Streltsov and Bruce Aitken. Background of the invention [0003] The present invention relates to methods of efficiently forming optical elements in glass. In particular, the present invention relates to direct writing methods for forming light-guiding structures in glass compositions by photoinduced refractive index changes using pulsed lasers with a pulse duration of less than about 150 femtoseconds. The invention also relates ...

Claims

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Application Information

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IPC IPC(8): G02B6/13B23K26/00B23K26/06G11C13/04H01S3/00
CPCG11C13/04B23K26/0635G11C13/041B23K26/0624G02B6/00
Inventor N·F·博雷利C·M·史密斯
Owner CORNING INC
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