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Preparation method of POSS-copper phthalocyanine dielectric monomer modified polystyrene material

A technology of polystyrene and copper phthalocyanine, applied in the field of preparation of POSS-copper phthalocyanine dielectric monomer modified polystyrene materials, can solve the problems of limited application

Pending Publication Date: 2022-07-29
葛焕军
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The dielectric loss of PS is low, but the dielectric constant is only 2.8 (at 100Hz), which limits its application in the field of electronic devices

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] A preparation method of POSS-copper phthalocyanine dielectric monomer modified polystyrene material, comprising the following steps:

[0030] Step S1, the synthesis of octa-alkenyl copper phthalocyanine monomer:

[0031] 10 g amino copper phthalocyanine (NH 2 -CuPc) and 20g 4-chloromethyl styrene add magnetic stirring in the there-necked flask, add the silica gel catalyst of 1g average particle diameter 100um simultaneously, reflux 3h at 60 DEG C, obtain octaaryl alkenyl copper phthalocyanine monomer;

[0032] Step S2, synthesis of POSS-copper phthalocyanine dielectric monomer:

[0033] In a three-necked flask equipped with a magnetic stirrer, a thermometer and a reflux condenser, add 24g of hydrogen-containing heptaphenyl silsesquioxane (POSS-H) and 3g of copper octaaryl phthalocyanine monomer, stir and reflux , when the temperature rises to 80 °C, add 0.3 g of chloroplatinic acid catalyst, react at a constant temperature for 2 h, and remove low boilers and incomplet...

Embodiment 2

[0037] A preparation method of POSS-copper phthalocyanine dielectric monomer modified polystyrene material, comprising the following steps:

[0038] Step S1, the synthesis of octa-alkenyl copper phthalocyanine monomer:

[0039] 5 g amino copper phthalocyanine (NH 2 -CuPc) and 15g 4-chloromethyl styrene are added in the there-necked flask with magnetic stirring, add the silica gel catalyst of 0.3g average particle diameter 100um simultaneously, reflux 5h at 50 DEG C, obtain octaaryl alkenyl copper phthalocyanine monomer ;

[0040] Step S2, synthesis of POSS-copper phthalocyanine dielectric monomer:

[0041] In a three-necked flask equipped with a magnetic stirrer, a thermometer and a reflux condenser, add 20g of hydrogen-containing heptaphenyl clathrate silsesquioxane (POSS-H), 5g of copper octaaryl phthalocyanine monomer, stir and reflux , when the temperature rises to 60°C, add 0.05g of chloroplatinic acid catalyst, react at constant temperature for 4h, remove low boilers ...

Embodiment 3

[0045] A preparation method of POSS-copper phthalocyanine dielectric monomer modified polystyrene material, comprising the following steps:

[0046] Step S1, the synthesis of octa-alkenyl copper phthalocyanine monomer:

[0047] 20 g amino copper phthalocyanine (NH 2 -CuPc) and 25g 4-chloromethyl styrene add magnetic stirring in the there-necked flask, add the silica gel catalyst of 3g average particle diameter 100um simultaneously, reflux 2h at 80 DEG C, obtain octaarylenyl copper phthalocyanine monomer;

[0048] Step S2, synthesis of POSS-copper phthalocyanine dielectric monomer:

[0049] In a three-necked flask equipped with a magnetic stirrer, a thermometer and a reflux condenser, add 35g of hydrogen-containing heptaphenyl cage silsesquioxane (POSS-H) and 10g of octaarylenyl copper phthalocyanine monomer, stir and reflux , when the temperature rises to 90°C, add 0.5g of chloroplatinic acid catalyst, react at constant temperature for 3h, remove low boilers and incompletely r...

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Abstract

The invention relates to the technical field of high dielectric PS material synthesis, and discloses a preparation method of a POSS-copper phthalocyanine dielectric monomer modified polystyrene material, and the preparation method comprises the following steps: carrying out substitution elimination reaction on an amino functional group of amino copper phthalocyanine (NH2-CuPc) and a chloromethyl functional group of 4-chloromethyl styrene to obtain an octaaryl alkenyl copper phthalocyanine monomer; the preparation method comprises the following steps: carrying out hydrosilylation reaction on an aryl alkenyl functional group of an octaaryl alkenyl copper phthalocyanine monomer and a silicon hydrogen functional group of hydrogen-containing heptaphenyl cage-shaped silsesquioxane (POSS-H) to obtain a POSS-copper phthalocyanine dielectric monomer; the POSS-copper phthalocyanine dielectric monomer modified polystyrene material with high dielectric constant and low dielectric loss is prepared by taking a POSS-copper phthalocyanine dielectric monomer as a filler and polystyrene as a polymer matrix.

Description

technical field [0001] The invention relates to the technical field of high-dielectric PS material synthesis, in particular to a preparation method of a POSS-copper phthalocyanine dielectric monomer modified polystyrene material. Background technique [0002] Polystyrene (PS) is an important engineering plastic with high mechanical strength, excellent thermal stability, dimensional stability and moisture resistance. The dielectric loss of PS is low, but the dielectric constant is only 2.8 (at 100Hz), which limits its application in the field of electronic devices. [0003] Phthalocyanines (Pcs) have a highly coplanar 18-electron large π-bonded conjugated structure, which coordinates with many metal ions and forms metal phthalocyanines (MPcs). MPcs are due to their excellent chemical stability and optoelectronic properties. The characteristics are widely used in many research fields such as catalytic materials, conductive materials, dielectric materials, solar cells and opti...

Claims

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Application Information

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IPC IPC(8): C08L25/06C08L83/08C08F112/08C08G77/26
CPCC08L25/06C08F112/08C08G77/045C08L83/08
Inventor 葛焕军
Owner 葛焕军
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