Preparation method and application of photoinitiator triphenyl sulfonium salt for ArF photoresist

A technology of sulfonium salt and triphenyl, which is applied in the field of preparation of photoinitiator triphenylsulfonium salt for ArF photoresist, can solve the problems of low flash point and unfavorable industrial production, and achieve easy purification and industrialization The effect of simple production and operation

Pending Publication Date: 2022-07-12
安徽秀朗新材料科技有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] This route uses tetraisopropyl titanate, which reacts too quickly with water in the air, reducing the actual flash point to 23°C, so this product is flammable, which is not conducive to industrial production

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  • Preparation method and application of photoinitiator triphenyl sulfonium salt for ArF photoresist
  • Preparation method and application of photoinitiator triphenyl sulfonium salt for ArF photoresist
  • Preparation method and application of photoinitiator triphenyl sulfonium salt for ArF photoresist

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Embodiment Construction

[0031] The following specific implementation examples are intended to further illustrate the present invention. The organic synthesis of the six molecules in the present invention includes some classical reactions, such as Suzuki coupling reaction, Bachwald-hartwig coupling reaction, Friedel-Crafts acylation reaction, intramolecular deesterification and ring closure reaction.

[0032] Implement column 1

[0033]

[0034] 1) Synthesis of 3-hydroxyadamantan-1-yl methyl ester of difluorobromoacetic acid

[0035]

[0036] 500ml of DCM was added to the 1000ml reaction flask, 3-hydroxymethyladamantan-1-ol (21.8g, 120mmol), HOBT (24.2g, 180mmol), EDCI (34.4g, 180mmol), TEA were successively added under stirring conditions (24.2g, 240mmol) and difluorobromoacetic acid (23g, 131.5mmol), after the addition, nitrogen was replaced 3 times, stirred at room temperature for 24h, added 200ml of water to the reaction flask to wash, the organic phase was washed with dilute hydrochloric a...

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Abstract

The invention relates to the field of organic synthesis, and particularly provides a preparation method of triphenyl sulfonium salt, which is characterized by comprising the following steps: step 1, taking difluorobromoacetic acid and alcohol as raw materials, and carrying out condensation reaction to obtain difluorobromoacetate; 2, carrying out a substitution reaction on the bromo difluoroacetate and sodium pyrosulfate to obtain sodium sulfonate; and 3, reacting the sodium sulfonate with triphenyl sulfur chloride to obtain the triphenyl sulfonium salt. The invention aims to provide a novel synthesis method which has the advantages of simplicity in operation, safety, high yield, easiness in purification and convenience in industrial production.

Description

technical field [0001] The application relates to the field of organic synthesis, in particular to a preparation method and application of a photoinitiator triphenylsulfonium salt for ArF photoresist. Background technique [0002] Photoinitiator is a kind of compound that can absorb a certain wavelength of energy in the ultraviolet region (250-420nm) or visible light region (400-800nm) to generate free radicals, cations, etc., thereby initiating the polymerization and crosslinking of monomers. The high-performance photoinitiator should have the following advantages: (1) cheap and simple to synthesize; (2) the photoinitiator and its photolysis products should be non-toxic and tasteless; 3) good stability, easy to store for a long time; (4) The absorption spectrum of the photoinitiator must match the emission band of the radiation source, and has a high molar extinction coefficient; (5) Since most photoinitiator molecules transition to the excited singlet state after absorbing...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C07C67/08C07C69/63C07C69/753C07C303/32C07C309/17C07C381/12G03F7/004
CPCC07C67/08C07C303/32C07C381/12G03F7/0045C07C2603/74C07C69/63C07C309/17C07C69/753Y02E60/10
Inventor 贾英明曹辰辉税新凤庞玉东
Owner 安徽秀朗新材料科技有限公司
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