1.55 [mu] m pulse laser and application thereof
A pulsed laser, dielectric film technology, applied in lasers, laser parts, phonon exciters, etc., can solve the problem of low beam pulse repetition frequency, achieve high thermal conductivity, high scanning speed, and increase the amount of data.
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Embodiment 1
[0029] The pump source adopts a 976nm semiconductor laser in pulse mode, the pump pulse period is 10ms, and the pump pulse width is 2ms. The pump laser is focused into the gain medium through the focusing coupling mirror. The waist spot diameter of the pump laser in the gain medium is is 300 μm. Using the semiconductor laser end-pumped (Er 0.005 Yb 0.05 Lu 0.945 ) 2 Si 2 o 7 The crystal was pumped with a peak incident power of 20W to obtain a 1.55μm micro-pulse laser with a repetition rate of 100Hz, a pulse energy of 120μJ and a pulse width of 2.1ns.
[0030] Adopt the steps described in this embodiment, can make 976nm semiconductor laser pump (Er 0.005 Yb 0.05 Lu 0.945 ) 2 Si 2 o 7 The crystal realizes 1.55μm band micro-pulse laser with 100Hz repetition frequency, 120μJ pulse energy and 2.1ns pulse width.
Embodiment 2
[0032] The pump pulse period of the 976nm semiconductor laser in Example 1 was adjusted to 5 ms, the pump pulse width was adjusted to 1 ms, and the waist spot diameter of the pump laser in the gain medium was adjusted to 300 μm. Using the semiconductor laser end-pumped (Er 0.005 Yb 0.05 Lu 0.945 ) 2 Si 2 o 7The crystal was pumped with a peak incident power of 25W to obtain a 1.55μm micro-pulse laser with a repetition rate of 200Hz, a pulse energy of 100μJ and a pulse width of 2.3ns.
[0033] Adopt the steps described in this embodiment, can make 976nm semiconductor laser pump (Er 0.005 Yb 0.05 Lu 0.945 ) 2 Si 2 o 7 The crystal realizes 1.55μm band micro-pulse laser with 200Hz repetition frequency, 100μJ pulse energy and 2.3ns pulse width.
Embodiment 3
[0035] The pump pulse period of the 976nm semiconductor laser in Example 1 was adjusted to 20 ms, the pump pulse width was adjusted to 4.0 ms, and the waist spot diameter of the pump laser in the gain medium was adjusted to 200 μm. Using the semiconductor laser end-pumped (Er 0.005 Yb 0.05 Lu 0.945 ) 2 Si 2 o 7 The crystal was pumped with a peak incident power of 15W to obtain a 1.55μm band micro-pulse laser with a repetition rate of 50Hz, a pulse energy of 160μJ and a pulse width of 1.9ns.
[0036] Adopt the steps described in this embodiment, can make 976nm semiconductor laser pump (Er 0.005 Yb 0.05 Lu 0.945 ) 2 Si 2 o 7 The crystal realizes 1.55μm band micro-pulse laser with 50Hz repetition rate, 160μJ pulse energy and 1.9ns pulse width.
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