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Magnetostrictive film target material structure and preparation method thereof

A magnetostrictive and thin film technology, applied in the field of magnetostrictive thin film target structure, can solve the problems of large difference in film composition and complex process, and achieve the effects of low saturation field, convenient operation and simple method

Pending Publication Date: 2022-04-12
HUAZHONG PHOTOELECTRIC TECH INST (CHINA SHIPBUILDING IND CORP THE NO 717 INST)
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Problems solved by technology

This method ignores that the iron plate will also contribute Fe atoms, which eventually leads to a large difference between the composition of the film and the requirement, requiring repeated experimental verifications, and the process is more complicated

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  • Magnetostrictive film target material structure and preparation method thereof

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Embodiment Construction

[0019] The implementation of the present invention will be described in detail below with reference to the drawings and specific examples, and those skilled in the art can understand other advantages and effects of the present invention from this description. It should be noted that the diagrams provided in this embodiment are only schematic diagrams to illustrate the basic idea of ​​the present invention, and the relevant components in the schematic diagrams are not necessarily drawn according to the number, shape and size of components in actual implementation. The shape, number, layout and proportion of each component may be more complicated.

[0020] According to the working principle of magnetron sputtering, during sputtering, the sputtering rate at each position of the target surface is determined by the energy distribution of ions on the target surface, that is, the energy distribution of ions is the same as the glow discharge during sputtering. The distribution of brig...

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Abstract

The invention discloses a magnetostrictive film target material structure which comprises a circular iron target and a concentric etching ring arranged on the iron target, dysprosium sheets and terbium sheets are alternately arranged on the etching ring in the radial direction, the terbium sheets and the dysprosium sheets are fixed through indium, the ratio of the sum of the surface areas of the terbium sheets and the dysprosium sheets to the surface area of the iron target is 1: 2alpha, wherein alpha is the ratio of the sputtering rates of the terbium target, the dysprosium target and the iron target under the same sputtering condition; the invention further discloses a preparation method. The sizes, the number and the placing positions of the terbium sheets and the dysprosium sheets can be rapidly estimated, the method is simple, the proportion of all the components in the film is adjusted conveniently and rapidly, and the magnetostrictive film which is low in saturation field, high in magnetostriction coefficient and excellent in performance is prepared.

Description

technical field [0001] The invention belongs to the technical field of material preparation, and in particular relates to a magnetostrictive film target structure and a preparation method thereof. Background technique [0002] At present, magnetostrictive materials are mainly divided into three categories: the main components of the first type of magnetostrictive materials are metals or alloys, such as nickel-based alloys and iron-based alloys, which usually have low resistivity and good ductility; the second is ferrite Magnetostrictive materials, such as Ni-Zn ferrite, have higher resistivity than alloys. These two types are magnetostrictive materials discovered earlier, and their magnetostriction coefficients are very small, at 10 -5 or so, so there has been no practical application. Until the 1970s, scientists discovered the third type of rare earth magnetostrictive materials: the most famous giant magnetostrictive material terbium dysprosium iron alloy, its magnetostri...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C23C14/14H01F41/18
Inventor 王建波张智杰吴新建董亭亭齐志强
Owner HUAZHONG PHOTOELECTRIC TECH INST (CHINA SHIPBUILDING IND CORP THE NO 717 INST)
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