Semiconductor structure and forming method thereof
A semiconductor and pattern structure technology, applied in semiconductor/solid-state device manufacturing, optics, instruments, etc., can solve the problems of increasing the difficulty and complexity of integrated circuits, improve the uniformity and controllability of the effect, and improve the uniformity of the line width. , Improve the effect of local line width uniformity
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[0014] Graphics transfers currently have poor precision. The reason for the poor accuracy of pattern transfer is now analyzed in combination with a method for forming a semiconductor structure.
[0015] Figure 1 to Figure 6 It is a structural schematic diagram corresponding to each step in a method for forming a semiconductor structure.
[0016] refer to figure 1 A substrate 10 is provided, and a hard mask material layer 11 and a material layer 20 to be doped located on the hard mask material layer 11 are formed on the substrate 10 .
[0017] combined reference Figure 1 to Figure 4 , performing doping treatment on the material layer 20 to be doped.
[0018] Specifically, the doping treatment includes:
[0019] like figure 1 As shown, a pattern structure layer 30 is formed on the material layer 20 to be doped, and the pattern structure layer 30 includes a planarization layer 31, an anti-reflection coating 32 and a patterned photoresist stacked sequentially from bottom ...
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