Silicon photon pin junction light attenuation structure
A silicon photonics and optical attenuation technology, applied in optics, nonlinear optics, instruments, etc., can solve the problems of slow response, high cost, polarization-related loss, etc., and achieve the effect of wide attenuation range and fast response
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[0031] It should be noted that, in the case of no conflict, the embodiments in the present application and the features in the embodiments can be combined with each other. The present application will be described in detail below with reference to the accompanying drawings and embodiments.
[0032] In this embodiment, a silicon photonic pin junction light attenuation structure is provided. The silicon photonic pin junction light attenuation structure is made on the basis of an SOI wafer. The SOI wafer includes: a base layer, a buried oxide layer and a device layer, wherein the device After the layer is etched, at least the first part remains, and the device layers on both sides of the first part are etched away, and the first part is the silicon light transmission waveguide; the two sides of the silicon light transmission waveguide respectively form a first step and a second step, wherein, The first step is ion implantation or diffusion step, and the second step is ion implant...
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