Multicolor antibacterial film layer and preparation method as well as application thereof

Abstract

The invention discloses a multicolor antibacterial film layer and a preparation method thereof. The preparation method comprises the following steps that (1) a substrate is cleaned; (2) the substrate treated in the step (1) is put into vacuum ion plating equipment to be vacuumized and preheated, and surface activation treatment is carried out; (3) a titanium layer is plated on the substrate treated in the step (2) on the same equipment; (4) a multicolor antibacterial film layer is continuously plated on the substrate treated in the step (3) on the same equipment; and (5) shutting down is carried out, and the substrate is taken out. The step of plating the multicolor antibacterial film layer on the substrate treated in the step (3) comprises the following steps that argon is introduced when the vacuum degree reaches 0.5 * 10 <-1 > to 3.0 * 10 <-1 > Pa, and the flow is controlled to be 150 to 280 cm < 3 > / min; the change range of an optical grating is set to be 48-75 degrees; the argon flow is changed, and acetylene and nitrogen are introduced; and an ion power supply is turned on, and a silver target and other target materials are turned on. The multicolor antibacterial film layer can be used for tableware, kitchen ware and other hardware, and is simple in process, good in antibacterial effect, multiple in color selection, high in production efficiency and low in cost.

Description

technical field [0001] The invention belongs to the technical field of antibacterial film layers, and in particular relates to a multi-color antibacterial film layer and a preparation method thereof. Background technique [0002] Physical vapor deposition (Physical Vapor Deposition, referred to as PVD), also known as vacuum coating, refers to the use of physical methods under vacuum conditions to vaporize the surface of the target (both the coating material, which can be solid or liquid) into gaseous atoms, molecules or Partially ionized into ions, and through a low-pressure gas (or plasma) process, deposited on the surface of the substrate (coated product) to have certain functions (such as high wear resistance, high hardness, high temperature resistance, rust resistance, electrical conductivity) , insulation, corrosion resistance, etc.) or a certain appearance (such as high or low brightness, one or more colors, etc.) of the film technology. Water plating is the well-know...

AI Technical Summary

Problems solved by technology

[0007] 1. The utilization rate of the target is low

The target used in vacuum sputtering plating is a large-area plate-shaped target, and the reaction process also requires the use of a strong magnetic field, which causes the part of the plate-shaped target close to the strong magnetic field line to be consumed faster, so the overall consumption of the target is uneven. When the part that consumes fast is about to be consumed, the target needs to be replaced, otherwise it will cause overheating and short circuit. At this time, the part that consumes slowly still has a lot of material that has not been utilized, so the utilization rate of the target is low

[0008] 2. The ability of winding plating is poor, the coverage is not complete, and the film formation is uneven

Since vacuum sputtering requires a strong power supply to generate a strong magnetic field, the particles will be affected by the strong magnetic field lines and move in a fixed direction, which does not have discreteness, resulting in strong winding plating ability, and cannot evenly cover the slits and grooves of the substrate. , inner hole part

[0009] 3. The film forming speed is slow and the coating time is long. The entire coating time often takes tens of minutes or even several hours, and the production efficiency is low.

[0010] 4. The film layer is not fine and smooth enough

Since vacuum sputtering requires glow discharge, glow discharge tends to generate certain impurity gases on the substrate and the materials of the coating equipment, which cannot maintain a high vacuum. Part of the impurities will participate in the coating reaction, which has a certain impact on the purity of the film material. Affected, the film layer is not fine and smooth enough, and there may even be bubbles

[0011] 5. The crystals of the film material are relatively large, which affects the fineness of the film

[0012] 6. The adhesion of the film layer is not strong enough

[0013] 7. Coating equipment is complex and expensive, leading to high production costs, which limits the range of products that want to use this technology (only high-value products can bear such production costs), which is not conducive to the entry of antibacterial film technology into the choice of consumers

This brings about two defects. One is that the transfer process takes time, which prolongs the time of the entire coating process, requires additional manpower and material resources, and increases the cost; Wear and tear, affect the antibacterial effect and color appearance of the antibacterial film layer in the subsequent steps

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