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Photoresist pigment color paste and preparation method thereof

A technology for pigment paste and photoresist, which is applied in pigment paste, photosensitive materials for opto-mechanical equipment, etc., and can solve problems such as uneven dispersion of pigments

Active Publication Date: 2021-07-02
纳琳威纳米科技南通有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to provide a photoresist pigment paste and a preparation method thereof, to solve the problem of uneven dispersion of pigments in the current photoresist pigment paste

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] A kind of photoresist pigment paste, by weight, mainly comprises: 10 parts of acrylic resin, 30 parts of pretreatment pigment, 5 parts of wetting and dispersing agent, 60 parts of propylene glycol methyl ether acetate and 5 parts of n-butyl acetate .

[0033] A preparation method of photoresist pigment paste, the preparation method of said photoresist pigment paste mainly comprises the following preparation steps:

[0034] (1) Mix the graphene oxide aqueous solution with a mass fraction of 3% and N,N-dimethylformamide at a mass ratio of 1:1, and then enter the cyclone separator together with nitrogen gas heated to 130°C for spray drying , to obtain a modified graphene blank;

[0035] (2) Put the modified graphene blank obtained in step (1) into the calciner, and pass nitrogen into the calciner, heat and reduce it at a temperature of 800 ° C for 2 hours, cool to room temperature and discharge to obtain the modified Graphene;

[0036] (3) After heating and melting the pa...

Embodiment 2

[0044] A kind of photoresist pigment paste, by weight, mainly comprises: 10 parts of acrylic resin, 30 parts of pretreatment pigment, 5 parts of wetting and dispersing agent, 60 parts of propylene glycol methyl ether acetate and 5 parts of n-butyl acetate .

[0045] A preparation method of photoresist pigment paste, the preparation method of said photoresist pigment paste mainly comprises the following preparation steps:

[0046] (1) After heating and melting the paraffin, and mixing it with an initiator 0.01 times the mass of the paraffin to obtain a paraffin mixture, mix the paraffin mixture and styrene in a flask at a mass ratio of 5:2, inject nitrogen gas into the flask, and After stirring and reacting at a temperature of 95°C for 3 hours, the pretreated paraffin was obtained. The mixed dispersion of the pretreated paraffin and maleic anhydride was mixed in a three-necked flask at a mass ratio of 2:1, and the temperature was 60°C in an air atmosphere. Stir and react under...

Embodiment 3

[0054] A kind of photoresist pigment paste, by weight, mainly comprises: 10 parts of acrylic resin, 30 parts of pretreatment pigment, 5 parts of wetting and dispersing agent, 60 parts of propylene glycol methyl ether acetate and 5 parts of n-butyl acetate .

[0055] A preparation method of photoresist pigment paste, the preparation method of said photoresist pigment paste mainly comprises the following preparation steps:

[0056] (1) After mixing the graphene oxide aqueous solution with a mass fraction of 3% and N,N-dimethylformamide at a mass ratio of 1:1, it enters a cyclone separator together with nitrogen gas heated to 130°C for spray drying , to obtain a modified graphene blank;

[0057] (2) Put the modified graphene blank obtained in step (1) into the calciner, and pass nitrogen gas into the calciner, heat and reduce it at a temperature of 800°C for 2 hours, then cool to room temperature and discharge to obtain the modified Graphene;

[0058] (3) After heating and mel...

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Abstract

The invention discloses photoresist pigment paste and a preparation method thereof, and relates to the technical field of liquid crystal display materials. The preparation method comprises the following steps: mixing a graphene oxide aqueous solution with N, N-dimethylformamide, carrying out spray drying on the obtained mixture and hot inert gas, carrying out thermal reduction to obtain modified graphene, mixing molten paraffin with an initiator, adding styrene, carrying out a reaction to obtain pretreated paraffin, mixing the pretreated paraffin and a toluene solution containing maleic anhydride, vinyl benzyl mercaptan and an initiator for a reaction, preparing modified paraffin, stirring and mixing the modified paraffin, modified graphene and pigment under the low-temperature condition, and performing stirring and mixing under the high-temperature condition to obtain pretreated pigment; finally, mixing propylene glycol methyl ether acetate with n-butyl acetate, adding acrylic resin, the pretreated pigment and a wetting dispersant, and performing stirring and mixing to obtain the photoresist pigment paste. The photoresist pigment color paste prepared by the invention has excellent stability and good pigment dispersity.

Description

technical field [0001] The invention relates to the technical field of liquid crystal display materials, in particular to a photoresist pigment color paste and a preparation method thereof, which are mainly used for photoresists used in display color filters. Background technique [0002] The main components of photoresist are resin, photosensitive agent, solvent and surfactant and other additives. Resin and sensitizer are used in combination, which is the main functional component of photoresist to play a photosensitive role. Different types of photoresists use different resins and sensitizers; the solvent used in various types of photoresists is mainly propylene glycol methyl ether acetate; Panel color and black photoresists require pigment dispersions or dyes in addition to the above components to develop color. At present, Japan occupies a dominant position in photoresist pigments, dispersions, and dyes. However, the photoresist pigment paste prepared in my country is ...

Claims

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Application Information

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IPC IPC(8): G03F7/004C09D17/00C08F289/00C08F212/08C08F212/14C08F222/08
CPCG03F7/004C09D17/003C08F289/00C08F212/08C08F212/30C08F222/08
Inventor 冯果林欲金肖琳叶航
Owner 纳琳威纳米科技南通有限公司
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