Developing cleaning agent and preparation method thereof

Abstract

The invention discloses a developing cleaning agent and a preparation method thereof. The developing cleaning agent is prepared from the following raw materials in parts by weight: 75-85 parts of pure water, 10-20 parts of a surfactant, 1-3 parts of diethylene glycol monobutyl ether, 0.05-0.15 part of a defoaming agent and 1-3 parts of potassium acrylate. The developing cleaning agent disclosed by the invention has the beneficial effects that the developing cleaning agent is a liquid medicine for improving the anti-adhesion of a dry film/wet film and ink, and can effectively inhibit the cross-linking reaction of a photosensitive polymer dissolved in a developing solution and avoid the formation of a polymer by cross combination of monomers, so that unpolymerized photoresist in a bath solution does not continue to generate a secondary polymerization reaction in a specific environment so as to reduce the proportion of poor quality caused by the anti-adhesion of the residual glue; and the developing cleaning agent disclosed by the invention can also be used for cleaning a groove body, so that line edges of a developing pattern are more neat and smoother, and the quality is improved.

Description

technical field [0001] The invention relates to the technical field of cleaning agents, in particular to a developing cleaning agent and a preparation method thereof. Background technique [0002] PCB is widely used in information, communication, industrial, medical, transportation, military, consumer and other electronic products as important electronic product components, and is the main support of electronic components and the carrier of electrical connection of electronic components. [0003] In the process of making the PCB, the exposure operation will be carried out by means of image transfer. Align the film with the circuit pattern according to the hole position of the PCB board and paste it on the PCB copper clad board with the dry film pressed, and the PCB board with the film pasted Put it into a manual exposure machine for exposure. After exposure, the circuit pattern on the film will be transferred to the dry film on the PCB surface. This completes the image tran...

AI Technical Summary

Problems solved by technology

[0004] In the process of image transfer, various photoresist materials need to be used, and the following problems exist in the use of photoresist: unpolymerized photoresist will produce Developer Sludge (developer sludge) in the developing section due to light, temperature, and pH value , so as to directly (short circuit) and indirect (appearance) affect the finished product yield and appearance problems

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