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Silicon wafer processing device and processing technology for chip preparation

A technology for processing devices and silicon wafers, which is applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve problems such as temperature softening deformation, clamping device offset, and lack of silicon wafer 4, so as to prevent softening and deformation Effect

Inactive Publication Date: 2021-05-25
六安优云通信技术有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Aiming at the deficiencies of the prior art, the present invention provides a silicon wafer processing device for chip preparation, which has the advantages of clamping and fixing the silicon wafer 4, air-cooled and water-cooled cooling, etc., and solves the problem that the silicon wafer 4 is easily Misalignment, softening and deformation due to high temperature

Method used

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  • Silicon wafer processing device and processing technology for chip preparation
  • Silicon wafer processing device and processing technology for chip preparation
  • Silicon wafer processing device and processing technology for chip preparation

Examples

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Embodiment 1

[0034] In a typical implementation of the present application, such as Figure 1-8As shown, a silicon wafer processing device for chip preparation includes a base plate 1, a support column 2 is fixedly connected to the top of the base plate 1, a support platform 3 is fixedly connected to the top of the support column 2, and a silicon wafer is arranged on the top of the support platform 3 4. The top of the bottom plate 1 is fixedly connected with two fixed plates 5, and the side walls of the two fixed plates 5 are provided with rotating holes, and the same two-way threaded rod 6 is connected to the rotating socket in the two rotating holes. The two ends of the rod 6 pass through the rotating holes respectively, and extend to the outsides of the two fixed plates 5. One end of the two-way threaded rod 6 is fixedly connected with a hand wheel 8, and two sliding blocks 9 are screwed on the two-way threaded rod 6. Perforations are provided on one side wall of each sliding block 9, a...

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PUM

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Abstract

The invention relates to the technical field of silicon wafer processing devices, and discloses a silicon wafer processing device and processing technology for chip preparation. A silicon wafer is polished through a polishing disc, a booster pump is started, water in a water tank is discharged into a water inlet pipe and then is discharged into the booster pump through the water inlet pipe, and cooling liquid is discharged into the water outlet pipe through the pressurization effect of the booster pump and finally is sprayed out through a porous nozzle, so the water cooling effect on the silicon wafer is realized during polishing. A coupling drives an input shaft to rotate, the input shaft drives a first driving belt wheel and a second driving belt wheel to rotate, a first driving belt wheel and a second driving belt wheel respectively drive a first driven belt wheel and a second driven belt wheel to rotate through a first transmission belt and a second transmission belt, so that a first rotating shaft and a second rotating shaft rotate, two cooling fans rotate, chippings generated during grinding can be treated through rotation of the cooling fans, and chippings are prevented from influencing the polishing sight.

Description

technical field [0001] The invention relates to the technical field of silicon wafer processing devices, in particular to a silicon wafer processing device and processing technology for chip preparation. Background technique [0002] Elemental silicon is a gray, brittle, tetravalent non-metallic chemical element. 27.8% of the earth's crust is composed of silicon, second only to oxygen. Silicon is a relatively abundant element in nature. Silicon can be found in , agate, flint and ordinary beach rocks. Silicon wafers, also known as wafers, are processed from silicon ingots. Millions of particles can be etched on silicon wafers through special processes. Transistors are widely used in the manufacture of integrated circuits. Silicon is a semiconductor material, and its own conductivity is not very good. However, its resistivity can be precisely controlled by adding appropriate dopants. Before manufacturing semiconductors, it must Converting silicon into wafers begins with the g...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/687H01L21/67
CPCH01L21/67109H01L21/68721
Inventor 徐振标王锋
Owner 六安优云通信技术有限公司
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