Preparation method of high-performance gallium oxide field effect transistor with insulating substrate
A technology of gallium oxide field and insulating substrate, which is used in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve the problem that lattice mismatch and thermal mismatch are difficult to eliminate, the quality of single crystal films is low, and the deposition rate is not high. Advanced problems, to achieve the effect of high lattice integrity, improved heat dissipation capacity and reliability, and high film quality
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0024] Example 1, in SiO 2 / p + - GaO-based devices fabricated on Si insulating substrates.
[0025] Step 1: Cleaning β-Ga 2 o 3 Substrates, such as figure 1 (a).
[0026] 1.1) Select the doping concentration to be 2.7e18 cm -3 , n-type β-Ga with a crystal orientation of (-201) 2 o 3 single crystal substrate;
[0027] 1.2) The selected β-Ga 2 o 3 The single crystal substrate was ultrasonically cleaned in acetone solution, absolute ethanol, and deionized water for 5 min each, and then dried with nitrogen.
[0028] Step 2: Preparation of β-Ga with a thickness of micron scale by mechanical exfoliation 2 o 3 film.
[0029] 2.1) Using the mechanical stripping method, the cleaned n-type β-Ga 2 o 3 Cleave the crystal along the (100) plane with a blade or tweezers on the single crystal substrate to obtain micron-sized β-Ga2 o 3 film, such as figure 1 (b);
[0030] 2.2) The prepared micron-sized β-Ga 2 o 3 The film is bonded to the tape, such as figure 1 (c).
[0...
Embodiment 2
[0046] Example 2, preparing a gallium oxide-based device on a sapphire insulating substrate.
[0047] Step A: Cleaning β-Ga 2 o 3 Substrates, such as figure 1 (a).
[0048] Use 6mm×6mm n-type β-Ga 2 o 3 Substrate, crystal orientation is (-201), n-type β-Ga 2 o 3 The doping concentration is 2.7e18cm -3 ; Place the selected substrate in acetone solution, absolute ethanol, and deionized water for ultrasonic cleaning for 5 minutes, and then dry it with nitrogen.
[0049] Step B: Preparation of β-Ga with a thickness of micrometers by mechanical exfoliation 2 o 3 film.
[0050] The specific embodiment of this step is the same as step 2 of embodiment 1.
[0051] Step C: Preparation of β-Ga with nanoscale thickness by multiple mechanical exfoliation 2 o 3 film, such as figure 1 (d).
[0052] will contain micron-sized β-Ga 2 o 3 The tape of the film is folded and bonded multiple times, and the β-Ga with a thickness of 75nm is obtained through multiple mechanical peelin...
Embodiment 3
[0063] Example 3, preparing a gallium oxide-based device on an m-AlN substrate.
[0064] Step 1: Cleaning β-Ga 2 o 3 Substrates, such as figure 1 (a).
[0065] First, choose a doping concentration of 1e18 cm -3 , n-type β-Ga with a crystal orientation of (-201) 2 o 3 single crystal substrate;
[0066] Then, the selected n-type β-Ga 2 o 3 The single crystal substrate was ultrasonically cleaned in acetone solution, absolute ethanol, and deionized water for 5 min each, and then dried with nitrogen.
[0067]Step 2: Preparation of β-Ga with a thickness of micron scale by mechanical exfoliation 2 o 3 film.
[0068] n-type β-Ga after cleaning 2 o 3 On the single crystal substrate, the crystal is cleaved along the (100) plane by a blade or tweezers, and the n-type β-Ga 2 o 3 Micron-sized β-Ga exfoliated from single crystal substrate 2 o 3 film, such as figure 1 (b);
[0069] Then the stripped micron-sized β-Ga 2 o 3 The film is bonded to the tape, such as figure ...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com