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Glass with low resistance and low optical loss and preparation method thereof

An optical loss, low resistance technology, applied in ion implantation plating, coating, metal material coating process, etc., can solve problems such as difficult to meet comprehensive use performance, conflict between optical performance and electrical performance of thin film materials, etc., to reduce optical performance. Loss, not easy to be corroded and oxidized, and the effect of reducing resistance

Active Publication Date: 2020-11-24
AVIC BEIJING INST OF AERONAUTICAL MATERIALS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

It is difficult for a single film to meet the comprehensive performance requirements, and the multilayer film structure takes into account the differences in physical and chemical properties between layers, how to solve the conflict between the optical properties and electrical properties of film materials, and the thickness of the film is the difficulty of the existing technology

Method used

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  • Glass with low resistance and low optical loss and preparation method thereof

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Effect test

Embodiment 1

[0042] Glass with low resistance and low optical loss: A transition layer, a first dielectric layer, a first protective layer, a conductive layer, a second protective layer, and a Second medium layer, anti-reflection layer, wear-resistant layer. The first and second dielectric layers are AZO, the first and second protective layers are NiCr, the conductive layer is Au, and the antireflection layer is Nb 2 o 5 , the wear layer is C 3 N 4 . The glass with low electrical resistance and low optical loss, the steps of its preparation method are,

[0043] (1) Use isopropanol and petroleum ether to clean the surface of the tempered glass.

[0044](2) Using plasma to perform surface pretreatment and activation on the cleaned strengthened glass.

[0045] (3) Coating 15nm SiO on the surface of the pretreated strengthened glass by DC pulse magnetron sputtering technology 2 The thin film acts as a transition layer.

[0046] (1) AZO film of 50nm is plated on the transition layer by ...

Embodiment 2

[0057] Glass with low resistance and low optical loss: A transition layer, a first dielectric layer, a first protective layer, a conductive layer, a second protective layer, and a Second medium layer, anti-reflection layer, wear-resistant layer. The first and second dielectric layers are AZO films, the first and second protective layers are NiCr, the conductive layer is Au, and the antireflection layer is SiO 2 , the wear layer is Si 3 N 4 . The glass with low electrical resistance and low optical loss, the steps of its preparation method are,

[0058] (1) Use isopropanol and petroleum ether to clean the surface of the tempered glass.

[0059] (2) Using plasma to perform surface pretreatment and activation on the cleaned strengthened glass.

[0060] (3) Coating 18nm SiO on the surface of the pretreated strengthened glass by DC pulse magnetron sputtering technology 2 The thin film acts as a transition layer.

[0061] (4) AZO film of 60nm is plated on the transition layer...

Embodiment 3

[0072] Glass with low resistance and low optical loss: coating transition layer, plated first dielectric layer, first protective layer, conductive layer, second protective layer, second dielectric layer on polymethyl methacrylate with a thickness of 10mm layer, anti-reflective layer, wear-resistant layer. The first and second dielectric layers are AZO films, the first and second protective layers are NiCr, the conductive layer is Au, and the antireflection layer is SiO 2 , the wear layer is C 3 N 4 . The glass with low electrical resistance and low optical loss, the steps of its preparation method are,

[0073] (1) Use isopropanol and petroleum ether to clean the surface of reinforced glass polymethyl methacrylate.

[0074] (2) Using plasma to pretreat and activate the surface of the cleaned polymethyl methacrylate.

[0075] (3) Coating a layer of acrylic and polyurethane mixture on the pretreated polymethyl methacrylate surface by coating technology and curing it as a tr...

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Abstract

The invention relates to a piece of glass with low resistance and low optical loss and a preparation method thereof. A multilayer thin film structure is prepared on inorganic glass, polycarbonate or organic glass by utilizing a coating technology and a magnetron sputtering technology and comprises a transition layer, a dielectric layer, a protective layer, a conductive layer, a protective layer, an anti-reflection layer and a wear-resistant layer, so that the multilayer thin film structure has low resistance and low optical loss performance. Compared with a current common indium tin oxide / silver / indium tin oxide sandwich structure, the multilayer thin film structure has the advantages of being low in cost, non-toxic, good in mechanical flexibility, good in chemical stability, good in filmadhesion, low in resistance, good in light transmission performance, suitable for high-temperature-resistant base materials and the like.

Description

technical field [0001] The invention relates to a glass with low resistance and low optical loss and a preparation method thereof, in particular to a glass with low resistance and low optical loss stacked by multilayer films and a preparation method thereof. Background technique [0002] Multilayer film structures with low resistance and low optical loss are widely used in liquid crystal displays, solar cells, functional windows and other fields. Generally, the electrical and optical properties of a single-layer functional film are difficult to meet the requirements of use at the same time. It is necessary to stack multi-layer films to form a composite structure to achieve low resistance (5-8Ω / ￡), high light transmittance (>80%), Good chemical stability and other properties. At present, the common LOW-E glass in this field adopts the sandwich structure of indium tin oxide / silver / indium tin oxide, but this structure has some disadvantages, such as the high price of indium...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/02C23C14/10C23C14/08C23C14/18C23C14/06C23C14/20C03C17/36C08J7/044C08J7/046C08J7/06C08L69/00C08L33/12
CPCC23C14/35C23C14/022C23C14/10C23C14/08C23C14/185C23C14/083C23C14/0641C23C14/205C03C17/3647C08J7/042C03C2218/156C08J2369/00C08J2333/12
Inventor 李佳明姜良宝李晓宇颜悦雷沛潘兴浩
Owner AVIC BEIJING INST OF AERONAUTICAL MATERIALS
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