Blind hole filling electrocoppering solution for HDI plate and carrier plate
A technology of electroplating copper and blind holes, which is applied in the field of material electrochemistry, can solve the problems of low electroplating reliability, short bath life, large resistance, etc., and achieve the effect of reducing the by-products of brighteners and improving the electroplating life
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Embodiment 1
[0056] The recipe consists of the following:
[0057] Copper sulfate pentahydrate: 200g / L
[0058] Sulfuric acid (98%): 50g / L
[0060] Sodium lignosulfonate: 1mg / L
[0061] Sodium dodecyl sulfonate: 300mg / L
[0062] N-Alkyl phthalimide: 20mg / L
[0063] Deionized water: balance
[0064] Solution preparation process: take 1L solution as an example, take 300ml of deionized water, add copper sulfate pentahydrate: 200g; sulfuric acid: 50g, copper chloride dihydrate: 0.114g, sodium lignosulfonate: 1mg; dodecyl Sodium sulfonate: 300 mg; N-alkylphthalimide: 20 mg, stir to dissolve, and then add deionized water to the liquid level to 1L.
[0065] Process parameters for electroplating using the copper electroplating solution prepared in this example: spray: 5min, temperature: 25±2°C, current density: 1.5ASD, stirring rate: 5TO / H, time: 60min. After the above-mentioned electroplating bath solution is prepared, electroplating needs to be carried out at...
Embodiment 2
[0069] The recipe consists of the following:
[0070] Copper sulfate pentahydrate: 180g / L
[0071] Sulfuric acid (98%): 50g / L
[0073] Sodium lignosulfonate: 1.5mg / L
[0074] Sodium dodecyl sulfonate: 400mg / L
[0075] N-Alkyl phthalimide: 20mg / L
[0076] n-Propanolamine: 40mg / L
[0077] Deionized water: balance
[0078] Solution preparation process: Take 1L solution as an example, take 300mL of deionized water, add copper sulfate pentahydrate: 180g; sulfuric acid: 50g, copper chloride dihydrate: 0.114g, sodium lignosulfonate: 1.5mg; dodecane Sodium sulfonate: 400 mg; N-alkylphthalimide: 20 mg, n-propanolamine: 40 mg, stir to dissolve, and then add the liquid level to 1L with deionized water.
[0079] Process parameters for electroplating using the copper electroplating solution prepared in this example: spray: 5min, temperature: 25±2°C, current density: 1.5ASD, stirring rate: 6TO / H, time: 60min. After the above-mentioned electroplating bat...
Embodiment 3
[0083] The recipe consists of the following:
[0084] Copper sulfate pentahydrate: 190g / L
[0085] Sulfuric acid (98%): 50g / L
[0087] Sodium 1-octanesulfonate: 2mg / L
[0088] Polyethyleneimine: 350mg / L
[0089] N-Alkyl phthalimide: 20mg / L
[0090] Hexamethylenetetramine: 45mg / L
[0091] Deionized water: balance
[0092] Solution preparation process: take 1L solution as an example, take 300mL of deionized water, add copper sulfate pentahydrate: 190g; sulfuric acid: 50g, copper chloride dihydrate: 0.137g, sodium 1-octanesulfonate: 2mg; polyethylene Imine: 350 mg; N-alkylphthalimide: 20 mg, hexamethylenetetramine: 45 mg, stir to dissolve, and then add the liquid level to 1L with deionized water.
[0093] Process parameters for electroplating using the copper electroplating solution prepared in this example: spray: 5min, temperature: 25±2°C, current density: 2ASD, stirring rate: 8TO / H, time: 50min. After the above-mentioned electroplating bat...
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