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Blind hole filling electrocoppering solution for HDI plate and carrier plate

A technology of electroplating copper and blind holes, which is applied in the field of material electrochemistry, can solve the problems of low electroplating reliability, short bath life, large resistance, etc., and achieve the effect of reducing the by-products of brighteners and improving the electroplating life

Active Publication Date: 2020-11-17
SHENZHEN CHENGGONG CHEM
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Aiming at the deficiencies in the above-mentioned technologies, the present invention provides a blind hole-filling electroplating copper solution for HDI boards and carrier boards, which solves the problem of low electroplating reliability and short bath life in the existing blind-hole electroplating process and other defects, the method of adding new additives is used to improve the stability of the bath solution, which can make the blind hole coating have better deep plating ability, excellent hole filling rate, no voids, no cracks, thin surface copper, and bright surface, which can effectively prevent blind holes. Pore ​​holes or equal wall growth lead to unstable signal transmission, high resistance, excessive power loss and other shortcomings, further improving the reliability of electronic products

Method used

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  • Blind hole filling electrocoppering solution for HDI plate and carrier plate
  • Blind hole filling electrocoppering solution for HDI plate and carrier plate
  • Blind hole filling electrocoppering solution for HDI plate and carrier plate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0056] The recipe consists of the following:

[0057] Copper sulfate pentahydrate: 200g / L

[0058] Sulfuric acid (98%): 50g / L

[0059] Chloride ion: 50mg / L

[0060] Sodium lignosulfonate: 1mg / L

[0061] Sodium dodecyl sulfonate: 300mg / L

[0062] N-Alkyl phthalimide: 20mg / L

[0063] Deionized water: balance

[0064] Solution preparation process: take 1L solution as an example, take 300ml of deionized water, add copper sulfate pentahydrate: 200g; sulfuric acid: 50g, copper chloride dihydrate: 0.114g, sodium lignosulfonate: 1mg; dodecyl Sodium sulfonate: 300 mg; N-alkylphthalimide: 20 mg, stir to dissolve, and then add deionized water to the liquid level to 1L.

[0065] Process parameters for electroplating using the copper electroplating solution prepared in this example: spray: 5min, temperature: 25±2°C, current density: 1.5ASD, stirring rate: 5TO / H, time: 60min. After the above-mentioned electroplating bath solution is prepared, electroplating needs to be carried out at...

Embodiment 2

[0069] The recipe consists of the following:

[0070] Copper sulfate pentahydrate: 180g / L

[0071] Sulfuric acid (98%): 50g / L

[0072] Chloride ion: 50mg / L

[0073] Sodium lignosulfonate: 1.5mg / L

[0074] Sodium dodecyl sulfonate: 400mg / L

[0075] N-Alkyl phthalimide: 20mg / L

[0076] n-Propanolamine: 40mg / L

[0077] Deionized water: balance

[0078] Solution preparation process: Take 1L solution as an example, take 300mL of deionized water, add copper sulfate pentahydrate: 180g; sulfuric acid: 50g, copper chloride dihydrate: 0.114g, sodium lignosulfonate: 1.5mg; dodecane Sodium sulfonate: 400 mg; N-alkylphthalimide: 20 mg, n-propanolamine: 40 mg, stir to dissolve, and then add the liquid level to 1L with deionized water.

[0079] Process parameters for electroplating using the copper electroplating solution prepared in this example: spray: 5min, temperature: 25±2°C, current density: 1.5ASD, stirring rate: 6TO / H, time: 60min. After the above-mentioned electroplating bat...

Embodiment 3

[0083] The recipe consists of the following:

[0084] Copper sulfate pentahydrate: 190g / L

[0085] Sulfuric acid (98%): 50g / L

[0086] Chloride ion: 60mg / L

[0087] Sodium 1-octanesulfonate: 2mg / L

[0088] Polyethyleneimine: 350mg / L

[0089] N-Alkyl phthalimide: 20mg / L

[0090] Hexamethylenetetramine: 45mg / L

[0091] Deionized water: balance

[0092] Solution preparation process: take 1L solution as an example, take 300mL of deionized water, add copper sulfate pentahydrate: 190g; sulfuric acid: 50g, copper chloride dihydrate: 0.137g, sodium 1-octanesulfonate: 2mg; polyethylene Imine: 350 mg; N-alkylphthalimide: 20 mg, hexamethylenetetramine: 45 mg, stir to dissolve, and then add the liquid level to 1L with deionized water.

[0093] Process parameters for electroplating using the copper electroplating solution prepared in this example: spray: 5min, temperature: 25±2°C, current density: 2ASD, stirring rate: 8TO / H, time: 50min. After the above-mentioned electroplating bat...

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Abstract

The invention discloses a blind hole filling electrocoppering solution for an HDI plate and a carrier plate. An electrocoppering solution comprises the following components of, in concentration, 150-200 g / L of copper sulfate pentahydrate, 40-80 g / L of sulfuric acid (98%), 30-70 mg / L of chloride ions, 0.5-4 mg / L of a brightening agent, 200-500 mg / L of a wetting agent, 5-30 mg / L of a leveling agent,30-100 mg / L of a new additive, and the balance deionized water. The above components are mixed according to the concentration to form the electrocoppering solution, when the electrocoppering solutionis used for electroplating, a Dummy sheet is firstly used for electrolyzing an electroplating bath to 2 AH / L, then electroplating is carried out at a current density of 1-3 A / dm<2 >, a temperature of15-35 DEG C, and a circulation rate of 2-8 TurnOver / H. According to the solution, the stability of a bath solution is improved through the method of adding the new additive, so that a blind hole plating layer is good in deepening plating ability, excellent in hole filling rate, free of voids and cracks, thin in surface copper and bright in surface, the defects of unstable signal transmission, high resistance, excessive power loss and the like caused by blind hole voids or equal-wall growth can be effectively prevented, and the reliability of an electronic product is further improved.

Description

technical field [0001] The invention relates to the field of material electrochemistry, in particular to a copper electroplating solution for blind hole filling for HDI boards and carrier boards. Background technique [0002] A printed circuit board (PCB) is a substrate for assembling electronic components, on which point-to-point connections and printed components are formed on a general-purpose substrate according to a predetermined design. The main function of this product is to make various electronic components form a predetermined circuit connection and play the role of relay transmission. Printed circuit board products are the basic substrates that cannot be separated from the modern information society, and are widely used in all aspects of our lives. [0003] The miniaturization and multi-functionalization of electronic products have promoted the development of printed circuit boards (PCBs) in the direction of circuit refinement and small hole miniaturization. Its ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25D3/38C25D7/00
CPCC25D3/38C25D7/00
Inventor 姚成洪学平姚吉豪
Owner SHENZHEN CHENGGONG CHEM
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