Method and device for synchronously compounding and manufacturing diamond micro-grating based on micro-additive and micro-subtractive
A technology of diamond micropowder and diamond, which is applied in the direction of manufacturing tools, laser welding equipment, metal processing equipment, etc., can solve the problems such as the decrease of the surface quality of diamond microstructure, the change of stress state of surrounding materials, and the stress concentration at the edge of microstructure, so as to promote the application and industrialization, improving the aspect ratio, and the effect of high quality and high aspect ratio
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[0045] The surface of the diamond film sample was pretreated, and the diamond film sample was immersed in a suspension prepared by diamond powder and glycerin at a mass ratio of 1:1 and ultrasonically ground for 5 minutes, wherein the particle size of the diamond powder was 5 μm, and then immersed in an anhydrous Ultrasonic cleaning in ethanol for 5 min, and then drying.
[0046] The pretreated diamond film samples were placed in figure 1 Among the devices shown, low-temperature hot-wire CVD diamond deposition is carried out on the surface of the diamond film sample. The process parameters used are: hydrogen flow rate 800ml / min, methane flow rate 50ml / min, hydrogen sulfide flow rate 0.1ml / min, reaction pressure 10Torr , the filament temperature is 2100-2200°C, the substrate temperature is 250°C; the bias current is 4.0A, and the deposition time is 50 hours.
[0047] While the low-temperature hot wire CVD diamond is deposited, laser etching and patterning micromachining are ca...
example 2
[0049] The surface of the diamond film sample was pretreated, and the diamond film sample was immersed in a suspension prepared by diamond powder and glycerin at a mass ratio of 1:1 and ultrasonically ground for 5 minutes, wherein the particle size of the diamond powder was 5 μm, and then immersed in an anhydrous Ultrasonic cleaning in ethanol for 5 min, and then drying.
[0050] The pretreated diamond film samples were placed in figure 1 Among the devices shown, low-temperature hot-wire CVD diamond deposition is carried out on the surface of the diamond film sample. The process parameters used are: hydrogen flow rate 1000ml / min, methane flow rate 100ml / min, hydrogen sulfide flow rate 0.4ml / min, reaction pressure 15Torr , the filament temperature is 2100-2200°C, the substrate temperature is 100°C; the bias current is 1.0A, and the deposition time is 80 hours.
[0051] While the low-temperature hot wire CVD diamond is deposited, laser etching and patterning micromachining are ...
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