Super-lubricity performance metal/hydrogen-containing carbon composite thin film and preparation method thereof
A metal thin film and carbon composite technology, applied in the field of solid lubrication and tribology, can solve problems such as high environmental dependence, difficult engineering application, and harsh super-slip conditions
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0026] (1) Clean the stainless steel substrate in an ultrasonic cleaning tank with a water-based cleaning solution and a hydrocarbon cleaning solution to remove oil stains, rust spots and pollutants, then dry it with nitrogen and place it into the coating vacuum chamber;
[0027] (2) Pump the vacuum system to 2.0×10 through mechanical pump, Roots pump and molecular pump in turn -3 Pa and below, turn on the hollow cathode ion source, adjust the current to 400A, and the bias voltage of 500; pass in argon, keep the pressure at 1Pa, bombard and clean for 200 minutes to further remove the substrate surface contaminants;
[0028] (3) Turn on the magnetron sputtering target (the target is Cr metal), adjust the peak current to 200A, bias 300 V, adjust the argon to 0.5Pa, and deposit for 20 minutes; pass in 15% nitrogen and 35% methane ( Compared with argon gas phase), adjust current 15A, bias voltage 300V, argon gas adjusted to 0.5, and deposit for 40 minutes to obtain a metal carbonitride ...
Embodiment 2
[0033] (1) Clean the mold steel substrate with water-based cleaning fluid and hydrocarbon cleaning fluid in an ultrasonic cleaning tank to remove oil stains, rust spots and pollutants, then dry it with nitrogen and place it into the coating vacuum chamber;
[0034] (2) Pump the vacuum system to 2.0×10 through mechanical pump, Roots pump and molecular pump in turn -3 Pa and below, turn on the hollow cathode ion source, adjust the current to 200A, and the bias voltage to 800V. Blow in argon, keep the pressure at 5Pa, bombard and clean for 30 minutes to further remove contaminants on the sample or substrate surface;
[0035] (3) Turn on the magnetron sputtering target (the target is Ti), adjust the peak current to 200A, the bias voltage of 300-500V, adjust the argon gas to 1.5Pa, and deposit for 40 minutes; pass in 10% nitrogen and 25-35% Methane (compared with argon gas phase), adjust the current 0.5-15A, bias 300-500V, adjust argon to 0.5-1.5Pa, deposit for 40-60 minutes, and obtain...
Embodiment 3
[0040] (1) Wash the silicon wafer substrate with a water-based cleaning solution and a hydrocarbon cleaning solution in an ultrasonic cleaning tank to remove oil stains, rust spots and pollutants, then dry it with nitrogen and place it into the coating vacuum chamber;
[0041] (2) Pump the vacuum system to 2.0×10 through mechanical pump, Roots pump and molecular pump in turn -3 Pa and below, turn on the hollow cathode ion source, adjust the current to 300A, and the bias voltage to 600V. Blow in argon gas, keep the pressure at 3Pa, bombard and clean for 30 minutes to further remove contaminants on the sample or substrate surface;
[0042] (3) Turn on the magnetron sputtering target (the target is Ti), adjust the peak current to 200A, bias 300-400V, adjust the argon to 1Pa, and deposit for 30 minutes; pass in 15% nitrogen and 255% methane (the same Argon gas phase comparison), adjust current 6A, bias voltage 500V, adjust argon to 1.5Pa, and deposit for 40 minutes to obtain metal carb...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com