Nanoimprint template, method for manufacturing the same, and method for releasing the same

A technology of nano-imprinting and manufacturing methods, applied in the field of nano-imprinting, which can solve problems such as the separation of imprinting glue and imprinting substrates, and achieve the effects of improving mass production yield, preventing separation, and improving imprinting quality

Active Publication Date: 2022-06-21
BOE TECH GRP CO LTD
View PDF1 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, the above-mentioned method cannot effectively solve the risk of separation of the imprinting glue and the imprinting substrate during the demoulding process. During the molding process, there is still a risk of separation of the imprint adhesive from the imprint substrate

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Nanoimprint template, method for manufacturing the same, and method for releasing the same
  • Nanoimprint template, method for manufacturing the same, and method for releasing the same
  • Nanoimprint template, method for manufacturing the same, and method for releasing the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0043] Exemplary embodiments will be described in detail herein, examples of which are illustrated in the accompanying drawings. Where the following description refers to the drawings, the same numerals in different drawings refer to the same or similar elements unless otherwise indicated. The implementations described in the following exemplary embodiments are not intended to represent all implementations consistent with this application. Rather, they are merely examples of apparatus and methods consistent with some aspects of the present application as recited in the appended claims.

[0044] The terms used in this application are for the purpose of describing particular embodiments only and are not intended to limit the application. As used in this application and the appended claims, the singular forms "a," "the," and "the" are intended to include the plural forms as well, unless the context clearly dictates otherwise.

[0045]It should be understood that "first", "secon...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The application discloses a nanoimprint template, a manufacturing method and a demoulding method thereof. The nanoimprint template includes a first template and a second template. The first template is provided with an embossing pattern, and the embossing pattern includes a plurality of embossing pillars at intervals and grooves between adjacent embossing pillars. The second template is provided with a filling pattern, and the filling pattern fills the groove of the first template, so that the first template and the second template are embedded, and the embossing column passes through the Second template. The nano-imprint template can reduce the risk of separation of the imprint glue from the imprint substrate.

Description

technical field [0001] The present application relates to nanoimprint technology, and in particular, to nanoimprint templates and their manufacturing methods and demolding methods. Background technique [0002] Nanoimprint technology has the advantages of high resolution, simple process, ultra-low cost, high productivity, etc., and is widely used in the fields of micro-nano manufacturing such as LED and semiconductor. Nanoimprinting, which can complete the mold forming process through simple UV exposure, is considered one of the most promising next-generation lithography technologies. However, there is a risk of peeling of the embossed resist and the embossed substrate during the demolding process. [0003] At present, one way to inhibit the separation of the embossing glue and the embossing substrate is to increase the bonding force between the embossing glue and the embossing substrate, for example, coating a primer layer on the embossing substrate so that the primer laye...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/00
CPCG03F7/0002
Inventor 周雪原张笑赵晋路彦辉李多辉宋梦亚
Owner BOE TECH GRP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products