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Antistatic agent, antistatic release film and preparation method of antistatic release film

An antistatic agent and antistatic technology, applied in the direction of conductive coatings, coatings, etc., can solve the problems of complex manufacturing process, affecting texture, and low production efficiency, and achieve stable chemical and physical properties, stable antistatic ability, and high production efficiency Effect

Inactive Publication Date: 2020-08-11
苏州鸿科新材料科技有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At the same time, there are also a small number of antistatic release films with conductive surfaces, but the production process is complicated, the cost is high, the production efficiency is low, and the antistatic effect of the product is not good, the release effect is unstable, the silicone oil is easy to transfer, and the appearance Bad question
[0005] In addition, some release films are coated by thermal curing. The curing temperature is high, which will cause the film to be stretched and wrinkled due to high temperature. The film will become hard and brittle after high temperature, which will seriously affect its texture
If the curing temperature is lowered, the curing will not be complete and its quality will be affected

Method used

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  • Antistatic agent, antistatic release film and preparation method of antistatic release film

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preparation example Construction

[0037] The present invention also provides a method for preparing an antistatic release film, comprising the steps of:

[0038] Mixing the conductive monomer, photocurable organosiloxane resin, photocurable silicone release agent and photoinitiator according to the weight ratio to obtain a mixture, and placing the mixture on the surface of the base film layer;

[0039] The set base film layer is subjected to photocuring treatment to obtain an antistatic release film.

[0040] In the present invention, the thickness of the mixture disposed on the surface of the base film layer is preferably 0.4-0.6 μm, more preferably 0.45-0.5 μm.

[0041] In the present invention, the photocuring treatment is preferably ultraviolet curing, and the irradiation intensity of the ultraviolet light is preferably 80-120W / cm, more preferably 90-110W / cm; the irradiation dose is preferably 100-400J / cm 2 , more preferably 200-300J / cm 2 ; The irradiation time is preferably 3-20s, more preferably 8-15s....

Embodiment 1

[0045] Take 100 grams of vinylmethyl oxazolidinone, 100 grams of photocurable organosiloxane resin TEGO RC711, 800 grams of photocurable silicone release agent TEGO RC902, 20 grams of photoinitiator TEGO PHOTOINITIATOR A18; put the above raw materials in order Mix and stir for 30 minutes to prepare the mixture; place the mixture on the surface of the PET film with a coating thickness of 0.5 μm; then perform UV curing, the irradiation intensity of ultraviolet light is 120W / cm, and the irradiation dose is 300J / cm 2 , The irradiation time was 3s, and the antistatic release film sample 1 was obtained.

Embodiment 2

[0047]Take 100 grams of vinylmethyl oxazolidinone, 100 grams of photocurable organosiloxane resin TEGO RC722, 800 grams of photocurable silicone release agent TEGO RC902, 20 grams of photoinitiator TEGO PHOTOINITIATOR A18; put the above raw materials in order Mix and stir for 30 minutes to prepare the mixture; place the mixture on the surface of the PET film with a coating thickness of 0.5 μm; then perform UV curing, the irradiation intensity of UV light is 120W / cm, and the irradiation dose is 300J / cm 2 , The irradiation time was 3s, and the antistatic release film sample 2 was obtained.

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Abstract

The invention relates to the technical field of film material preparation, in particular to an antistatic agent, an antistatic release film and a preparation method of the antistatic release film. Theantistatic release film comprises a base film layer and a functional layer, wherein the functional layer is prepared from the antistatic agent. The antistatic agent comprises the following componentsin parts by weight: 0.05-0.5 parts of a conductive monomer, 20-40 parts of light-cured organic siloxane resin, 60-80 parts of a light-cured organic silicon release agent and 0.05-0.5 parts of a photoinitiator. The antistatic release film disclosed by the invention is stable in characteristics, adopts a photocuring mode, is thorough in curing, forms a polymer film, and is stable in chemical and physical properties, stable in stripping force and antistatic capacity, good in adhesive force and less in silicon transfer. The process is simple and is completed at one time, the production efficiencyis high, the cost is low, and few waste materials are generated in production.

Description

technical field [0001] The invention relates to the technical field of film material preparation, in particular to an antistatic agent, an antistatic release film and a preparation method thereof. Background technique [0002] For the release materials currently on the market, due to the mutual friction, peeling, extrusion, etc. between the material and the machine guide roller and the material and the material, the surface area of ​​the material will store charges of different natures. When the charge accumulates to a certain extent, it will A discharge phenomenon occurs. The discharge of static electricity will have a great impact on production, such as material adsorption of dust, material coating breakdown, human body electric shock, fire, etc. [0003] Polyolefins represented by polyethylene (PE) and polypropylene (PP) are the most widely used general-purpose plastics. Polyolefins have the advantages of low price, water resistance, good chemical stability, and easy mol...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09D183/06C09D5/24C09D5/20C08J7/04C08J7/044C08L67/02
CPCC08J7/04C08J2367/02C08J2483/06C08L2201/04C08L2205/025C09D5/20C09D5/24C09D183/06C08J7/0427C08J7/044C08L83/06
Inventor 张诗强虞驰程
Owner 苏州鸿科新材料科技有限公司
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