Method for preparing three-dimensional optical waveguide and photonic device structure in transparent material

Abstract

The invention discloses a method for preparing a three-dimensional optical waveguide and a photonic device structure in a transparent material. The method comprises the steps of preparing a three-dimensional micro-channel in the transparent material based on the ultrafast laser selective wet etching, and then filling the micro-channel with a wave guide material, thereby forming the three-dimensional optical waveguide. Controllable preparation of various functional optical waveguide devices can be realized by manufacturing micro-channel structures with different spatial configurations. Comparedwith a traditional optical waveguide preparation method, the method has the following technical advantages that high-quality preparation of near-infrared and middle-infrared waveband waveguides, polarization-independent waveguides and active waveguide devices can be achieved by flexibly selecting filling materials, an optical waveguide mode field is flexible and controllable, and a small bendingradius can be achieved; and in combination with the three-dimensional characteristic of ultrafast laser processing, a complex three-dimensional photonic loop can be integrated on the chip in a high-density manner. Therefore, the method has important application value in the fields of optical communication networks, optical interconnection, astronomical photonics, micro-fluidic chips and the like.

Description

technical field [0001] The invention relates to the field of integrated optical waveguide preparation technology, integrated optical waveguide devices and ultrafast laser micro-nano processing, in particular to a method for preparing three-dimensional optical waveguides and photonic device structures inside transparent materials using ultrafast lasers. Background technique [0002] Optical waveguide preparation technology is a highly applicable technology. In order to realize the transmission and manipulation of light, various optical waveguide preparation technologies have been developed based on different materials. Optical waveguide devices with various characteristics can be made by using optical waveguides, and an integrated optical circuit with specific functions can be formed by integrating optical waveguides and optical waveguide devices. However, most of the optical waveguides produced by the current preparation technology are planar two-dimensional optical wavegui...

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the present invention is to overcome the limitations of the optical waveguide prepared by the existing femtosecond laser direct writing optical waveguide technology, the limited change of the refractive index, the large bending radius, the difficulty in controlling the size of the mode field, and the fact that the existing main optical waveguide preparation technology only A new method for preparing three-dimensional optical waveguides and photonic device structures in transparent materials using ultrafast laser

Images