Preparation method of graphite thermal field material for czochralski silicon crystal furnace
A thermal field material and single crystal technology, which is applied in the field of graphite thermal field material preparation for Czochralski single crystal silicon furnaces, can solve the problems of Si evaporation and SiC, heat preservation tube deformation, low temperature, etc., and achieve uniform and fine structure, chemical The effect of excellent indicators and scientific preparation process
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment Construction
[0043] The technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are only some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0044]A method for preparing a graphite thermal field material for a Czochralski single crystal silicon furnace, comprising the following steps:
[0045] S1. Crushing, screening, and batching are to screen aggregates and powders according to the above particle sizes and batch them;
[0046] S2. Kneading: Add the graded ingredients into the kneading pot for stirring. The kneading is divided into dry mixing and wet mixing. The dry mixing is to add the aggregate and powder into the kneading pot for stirring. The kneading pot is a doubl...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com