Novel etching alkali tank

Abstract

The invention discloses a novel etching alkali tank. The novel etching alkali tank comprises: a tank body, wherein the tank body comprises a main tank, an auxiliary tank and a connecting pipe, and themain tank and the auxiliary tank are connected and communicated through the connecting pipe, the main tank comprises a first main tank body and a second main tank body which are oppositely arranged,and a filter screen is formed between the first main tank body and the second main tank body; multiple sets of water pressing rollers which are arranged in parallel, are arranged in the first main tank body and the second main tank body in the direction perpendicular to the moving direction of the silicon wafer, and are rotationally connected with the first main tank body and the second main tankbody; and a liquid spraying pipe which is fixed in the second main tank body, wherein the liquid spraying pipe and the water pressing rollers are arranged in parallel, and a nozzle is connected to theliquid spraying pipe. The novel etching alkali tank is reasonable in design, simple in structure, convenient to operate, space-saving and rich in function, integrates immersion and spraying functions, and can remarkably improve the processing efficiency of silicon wafers and reduce the reject ratio in the production process of the silicon wafers.

Description

technical field [0001] The invention relates to the technical field of photovoltaic crystal silicon wafer processing equipment, and more specifically relates to a novel etching alkali tank. Background technique [0002] With the rapid approach of photovoltaic grid parity, 2019 will become a milestone in the global solar industry. The cost of GF continues to decline, creating huge opportunities for us. At the same time, there is a strong demand for cells with high conversion efficiency. Continuously improving the conversion efficiency of cells is a must The direction and driving force for the continuous advancement of the photovoltaic industry. [0003] The mainstream PERC process in the industry mainly improves the passivation effect of the front and back of the battery while improving the efficiency of auxiliary materials in each process. The mainstream passivation processes include annealing, thermal oxygen, ALD, and back plating; Miscellaneous and positive contact have a...

AI Technical Summary

Problems solved by technology

[0006] In view of this, in order to solve the technical defects of low processing efficiency and poor quality of photovoltaic silicon cells caused by the separate use of the spray type alkali tank and the submerged alkali tank in the prior art, the present invention provides a spray type Alkali tank and submerged alkali tank are combined into one new etching alkali tank to improve the quality of photovoltaic crystalline silicon cells

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