Ultrafast-response overcharge-prevention electrochromic device and preparation method thereof
An electrochromic device and electrochromic layer technology, applied in instruments, nonlinear optics, optics, etc., can solve the problems of low coloring efficiency, weak high-voltage bearing capacity, slow response speed, etc. Insulation ability, the effect of preventing electric leakage
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[0048] The present invention also provides a method for preparing a novel electrochromic device with ultra-fast response and anti-overcharge, comprising the following steps: depositing an inorganic electrochromic layer and an electron blocking layer on the surface of the second transparent electrode in sequence; An electromechanical layer; an ion conducting layer is prepared on the surface of the organic electrochromic layer; finally, a first transparent electrode is deposited on the surface of the ion conducting layer.
[0049] The preparation of the inorganic electrochromic layer and the electron blocking layer can adopt the magnetron sputtering method. Organic electrochromic layers can be obtained by evaporation. Resin-based ion transport layers can be obtained by screen printing or vacuum infusion. The first and second transparent electrodes can be obtained by spin coating or magnetron sputtering.
[0050] The above electrochromic device can be applied in electrochromic ...
Embodiment 1
[0058] First, the commercially available ITO transparent conductive glass is used as the substrate. After ultrasonically cleaning the substrate with acetone, ethanol, and deionized water for 20 minutes, fix it on the substrate tray with high-temperature tape, put it into the sample chamber, turn on the mechanical pump to pump it below 5 Pa, open the baffle valve, and send it to a vacuum ( background vacuum) to reach 10 -4 In the sputtering chamber below Pa. The inorganic electrochromic layer and electron blocking layer are prepared by continuous deposition on its surface. Through the magnetron sputtering method, metal tungsten is used as the target, the sputtering gas is argon and oxygen, the total pressure is 2.0Pa, the oxygen partial pressure is 6%, the distance between the target and the substrate is 15cm, and the initial substrate temperature is room temperature , the DC power applied to the target is 70W or the power density is 1.54W / cm 2 , the deposition time is 30 mi...
Embodiment 2
[0060] First, the commercially available ITO transparent conductive glass is used as the substrate. After ultrasonically cleaning the substrate with acetone, ethanol, and deionized water for 10 minutes, fix it on the substrate tray with high-temperature tape, put it into the sample chamber, turn on the mechanical pump to pump it below 5 Pa, open the baffle valve, and send it into the vacuum (background vacuum) to reach 10 -4 In the sputtering chamber below Pa. The inorganic electrochromic layer and electron blocking layer are prepared by continuous deposition on its surface. Through the magnetron sputtering method, metal tungsten is used as the target, the sputtering gas is argon and oxygen, the total pressure is 2.0Pa, the oxygen partial pressure is 6%, the distance between the target and the substrate is 15cm, and the initial substrate temperature is room temperature , the DC power applied to the target is 70W or the power density is 1.54W / cm 2 , the deposition time is 30...
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