Self-lubricating wear-resistant AlCrN/MoS2 nanometer composite film and preparation method thereof

A nano-composite, wear-resistant technology, applied in the direction of ion implantation plating, metal material coating process, coating, etc., can solve the problem of low deposition rate, achieve low friction coefficient, good chemical stability, and enhance wear resistance performance effect

Inactive Publication Date: 2020-01-10
TIANJIN UNIV OF TECH & EDUCATION TEACHER DEV CENT OF CHINA VOCATIONAL TRAINING & GUIDANCE
View PDF7 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the serious discharge in the vacuum chamber and the low deposition rate (generally 30% to 80% of the pulse rate) are still unresolved problems in HiPIMS technology. If the composite pulsed DC magnetron sputtering technology is used, the above shortcomings can be effectively compensated, and the excellent performance can be prepared. film

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Self-lubricating wear-resistant AlCrN/MoS2 nanometer composite film and preparation method thereof
  • Self-lubricating wear-resistant AlCrN/MoS2 nanometer composite film and preparation method thereof
  • Self-lubricating wear-resistant AlCrN/MoS2 nanometer composite film and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] In this embodiment, a high-power pulsed magnetron sputtering and pulsed DC magnetron sputtering composite coating system is used to deposit AlCrN / MoS 2 film. The specific operation steps are as follows:

[0038] (1) The substrate was ultrasonically cleaned in acetone and alcohol solutions for 30 minutes, and then cleaned with high-purity N 2 (purity is 99.999%) blow dry, and then fix the substrate on the turntable in the coating chamber.

[0039] (2) AlCr alloy target connected to high power pulsed magnetron sputtering power supply, MoS 2 The target is connected to the pulsed DC magnetron sputtering power supply; the background vacuum is pumped to 3.0×10 -3 Above Pa, then heat the substrate to 300°C, then apply -780V bias, pass Ar (purity 99.999%) into the vacuum chamber, the flow rate is 110sccm, control the throttle valve to maintain the working pressure at 1.1Pa, glow discharge Wash for 10 minutes to remove impurities on the surface of the substrate.

[0040] ...

Embodiment 2

[0051] In this example, a composite coating system of high-power pulsed magnetron sputtering and pulsed DC magnetron sputtering is used to deposit AlCrN / MoS 2 film. The specific operation steps are as follows:

[0052] (1) The substrate was ultrasonically cleaned in acetone and alcohol solutions for 30 minutes, and then cleaned with high-purity N 2 Blow dry, and then fix the substrate on the turntable in the vacuum coating chamber.

[0053] (2) Connect AlCr alloy target to high power pulsed magnetron sputtering power supply, MoS 2 The target is connected to the pulsed DC magnetron sputtering power supply; the background vacuum is higher than 3.0×10 -3 Pa, then heat the substrate to 300°C, apply a bias voltage of -785V, feed Ar into the vacuum chamber with a flow rate of 150 sccm, adjust the throttle valve to maintain the working pressure at 1.2 Pa, and glow clean for 10 minutes to remove impurities on the surface of the substrate.

[0054] (3) Adjust the Ar flow rate to ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thermal resistanceaaaaaaaaaa
hardnessaaaaaaaaaa
hardnessaaaaaaaaaa
Login to view more

Abstract

The invention discloses self-lubricating wear-resistant AlCrN / MoS2 nanometer composite film and a preparation method of the self-lubricating wear-resistant AlCrN / MoS2 nanometer composite film and belongs to the technical field of films. The AlCrN / MoS2 nanometer composite film is prepared on a cutter matrix by the adoption of high-power pulse and pulse direct current magnetic control combined filmcoating technology; in the deposition process, bias voltage is adjusted to be -50 - -150 V, and then mixed gas of N2 and Ar is fed; the work atmosphere pressure is kept at 0.5-1.0 Pa, the power of a AlCr target is kept at 0.5-1.0 kW, the power of the MoS2 target is 0.05-0.3 kW, and after deposition, the AlCrN / MoS2 nanometer composite film is obtained. The prepared AlCrN / MoS2 nanometer composite film has good lubricating performance, can significantly improve the wear resistance of the matrix and has good chemical stability, and wear debris is prone to transferring to a friction interface to form a lubricating film.

Description

technical field [0001] The invention relates to the field of thin film technology, in particular to a self-lubricating and wear-resistant AlCrN / MoS 2 Nanocomposite film and method for its preparation. Background technique [0002] With the rapid development of modern industry, various difficult-to-machine materials are increasing, and higher requirements are placed on the cutting performance of cutting tools. Coating on the surface of cutting tools is an effective method to improve the life of cutting tools. The traditional nitride-coated tools of the second institute have disadvantages such as high cutting temperature, high friction coefficient and easy tool wear during cutting, which seriously limit their application. At present, the composition of tool coatings is gradually developing into multi-components. Multi-component hard coatings have the advantages of high hardness and good wear resistance, which can significantly improve the service life of tools and the surface...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/06
CPCC23C14/0036C23C14/0623C23C14/0641C23C14/3485C23C14/35
Inventor 王铁钢蒙德强许人仁刘艳梅阎兵尹照星
Owner TIANJIN UNIV OF TECH & EDUCATION TEACHER DEV CENT OF CHINA VOCATIONAL TRAINING & GUIDANCE
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap