Terahertz semiconductor laser, its preparation method and application
A semiconductor and laser technology, applied in the structure of semiconductor lasers, lasers, optical waveguide semiconductors, etc., can solve the problems of high peak power of single cavity surface, low device power, and high threshold current density, and achieve small beam divergence angle and output power. Improve the effect of simple production process
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[0075] The present invention also discloses a preparation method of the above-mentioned terahertz semiconductor laser, comprising the following steps:
[0076] (1) sequentially growing a first highly doped layer, an active region, and a second highly doped layer on a supporting substrate;
[0077] (2) Make the first multi-ridge region, the rectangular cavity region, and the second multi-ridge region on the active region and the second highly doped layer, and at the junction of the first multi-ridge region, the second multi-ridge region and the rectangular cavity region Making electrical isolation trenches;
[0078] (3) growing a silicon dioxide layer on the upper surface of the device formed in step (2), and opening an electrical injection window on the silicon dioxide layer;
[0079] (4) making ohmic contact layers respectively on the second highly doped layer and the first highly doped layer of the electrical injection window;
[0080] (5) growing a second metal layer on t...
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