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L-shaped chlorine spraying absorber for acid etching liquid recycling system

A regenerative system and absorber technology, applied in chemical instruments and methods, dispersed particle separation, separation methods, etc., can solve problems such as inability to reuse chlorine gas, deteriorate working environment, and limited efficiency, so as to improve convenience and absorption Efficiency, the effect of improving efficiency

Pending Publication Date: 2019-07-12
深圳众意远诚环保科技有限公司
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Problems solved by technology

[0003] However, the electrolytic cell anode of this process will generate a large amount of chlorine gas, which not only pollutes the air, but also deteriorates the working environment. However, the efficiency of the existing chlorine gas recovery system is limited, and the chlorine gas cannot be effectively reutilized during the treatment process. Therefore, we Propose an L-type chlorine spray absorber for acid etching solution circulation regeneration system

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  • L-shaped chlorine spraying absorber for acid etching liquid recycling system
  • L-shaped chlorine spraying absorber for acid etching liquid recycling system
  • L-shaped chlorine spraying absorber for acid etching liquid recycling system

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Embodiment Construction

[0024] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0025] see Figure 1-7 , the present invention provides a technical solution: an L-type chlorine spray absorber for an acidic etching solution circulation regeneration system, including a nozzle 1, an L-shaped feed pipe 2, a one-way inlet valve 3, a gas mixing pipe 4, and a diffuser pipe 5 and an auxiliary gas mixing device 6, the nozzle 1 is fixedly installed on one end of the L-shaped feed pipe 2 through a flange, the one-way inlet valve 3 is fixed on the ou...

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Abstract

The invention discloses an L-shaped chlorine spraying absorber of an acid etching liquid recycling system. The L-shaped chlorine spraying absorber comprises a nozzle, an L-shaped feeding pipe, a one-way air inlet valve, a gas mixing pipe, a diffusion pipe and an auxiliary gas mixing device, the nozzle is fixedly arranged at one end of the L-shaped feeding pipe through a flange, and the one-way airinlet valve penetrates through and is fixed in the outer side of the L-shaped feeding pipe, the gas mixing pipe is fixedly arranged at one end, far away from the nozzle, of the L-shaped feeding pipe,and one end,far away from the l-shaped feeding pipe, of the gas mixing pipe is fixedly connected with the diffusion pipe. According to the L-shaped chlorine spraying absorber of the acid etching liquid recycling system, the L-shaped chlorine spraying and absorbing device is arranged, the chlorine can be efficiently absorbed and be mixed to recycle at the same time, the efficiency of chlorine recycle in the acid etching liquid recycling system is greatly improved., and meanwhile, the secondary utilization capability is improved; and the waste of the chlorine resources is avoided by direct secondary utilization.

Description

technical field [0001] The invention relates to the technical field of recycling and regeneration of acid etching solution, in particular to an L-type chlorine gas spray absorber for a recycling and regeneration system of acid etching solution. Background technique [0002] The acidic etching regeneration adopts the "ion membrane electrolytic copper" process, which uses the ion membrane to separate the anode area and the cathode area of ​​the electrolytic cell into two independent areas. The monovalent copper ions in the waste etching solution generate divalent copper ions through an electrochemical reaction, so that the waste etching solution can be regenerated. The cathode area is the copper recovery area, and the ions in the solution are selectively migrated through the ion diaphragm, so that the solution The copper ions in the solution get electrons and are reduced to metallic copper. [0003] However, the electrolytic cell anode of this process will generate a large am...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/46B01D53/68B01D53/78
CPCC23F1/46B01D53/68B01D53/78
Inventor 葛志强严芝维
Owner 深圳众意远诚环保科技有限公司
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