Combined magnetic field and lining conical pipe and ladder pipe composite vacuum coating method

Abstract

The invention discloses a combined magnetic field and lining conical pipe and ladder pipe composite vacuum coating method, and belongs to the technical field of material surface treatment. The problems that during arc ion plating, due to macroparticles, a thin film is polluted, target use is limited, magnetically filtered arc plasmas are damaged, and high-power pulse magnetic control discharge isnot stable are solved. A device comprises an arc ion plating target source, a multi-stage magnetic field device, a movable coil device, a twin target high-power pulse magnetron sputtering target source, a lining bias conical pipe and ladder pipe combined device and related power source, a grid bias power supply, a waveform matching device and the like. The method comprises the steps of thin film deposition, device connecting and system starting. When the vacuum degree in a vacuum chamber is smaller than 10<-4> Pa, work gas is led in, a coating power source is started, energy of plasmas can beadjusted through the grid bias power supply, the multi-stage magnetic field device and the movable coil device remove macroparticle defects and guide transmission of composite plasmas, losses in the vacuum chamber are reduced, and process parameters are set.

Description

Technical field [0001] The invention relates to a vacuum coating method combining a magnetic field and a tapered tube lining and a stepped tube, and belongs to the technical field of material surface treatment. Background technique [0002] In the process of preparing thin film by arc ion plating, the current density of arc spot is as high as 2.5~5×10 10 A / m 2 , Causing molten liquid metal to appear at the arc spot on the surface of the target, which is sprayed out in the form of droplets under the action of the partial plasma pressure, attached to the surface of the film or embedded in the film to form "Macroparticles" (Macroparticles) Defects (BoxmanR L, Goldsmith S. Macroparticle contamination in cathodic arc coatings: generation, transport and control [J]. Surf Coat Tech, 1992, 52(1): 39-50.). In arc plasma, since the moving speed of electrons is much greater than that of ions, the number of electrons reaching the surface of large particles per unit time is greater than the n...

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to solve the problem of low ionization rate and thin film deposition efficiency of traditional magnetron sputtering technology, the limitation of high melting point target material use, and the current high-power pulse magnetron sputtering. The plating method uses high melting point targets, low melting point pure metals (such as aluminum, tin) or multi-element alloy materials (such as AlSi alloys) and non-metallic materials (such as graphite and semiconductor materials Si) as targets that are prone to large particle defects, bending Low efficiency of arc plasma transmission caused by type magnetic filter technology, limitation of target element usage and uniform ablation, thin film deposition density and defects, deposition position limitation caused by vacuum chamber space and target source layout design, workpiece shape limitation and different target In order to solve problems such as contamination of film components caused by secondary sputtering of residues in multi-level magnetic field devices, pure metals with low melting points (such as aluminum, tin) or multi-element alloy materials (such as AlSi alloys) and non-metallic materials (such as graphite and Semiconductor material Si, etc.) as the target material of high-power pulsed magnetron sputtering, and then use the arc ion plating method to realize the high melting point refractory target material to produce continuous and stable plasma with high ionization rate, combined with multi-level magnetic field filtering method and The shape constraints of the lined bias conical tube and the stepped tube combination device and the combined effect of bias electric field attraction eliminate the large particle defects contained in the arc plasma, and at the same time ensure that the arc plasma passes through the inner tube with high transmission efficiency. The combined device of the lined bias conical tube and the stepped tube and the multi-stage magnetic field filter device, and then use the combined effect of the magnetic field confinement of the movable coil device and the self-bias electric field attraction to eliminate the interference from the multi-stage magnetic field device and the lined bias conical tube. The large particle defects contained in the arc plasma transmitted by the combined device of the tube and the stepped tube, and the moving coil device is used to control the transmission direction of the composite plasma of the twin target high-power pulse magnetron sputtering and arc ion plating in the vacuum chamber, Realize the control and adjustment of film deposition and film composition on the surface of the substrate workpiece at any position in the vacuum chamber, reduce the loss of composite plasma in the vacuum chamber, and overcome the problem of uneven film deposition caused by the limitation of the position of the vacuum chamber and the target source or the limitation of the shape of the substrate. Thoroughly remove the large particle defects that may remain in the arc plasma transmitted from the multi-level magnetic field device and the combination device of the lined bias conical tube and stepped tube, so that the surface of the workpiece can adjust the ion energy under the condition of negative bias , use the bias electric field suppression effect on the surface of the substrate to remove large particle defects in the arc plasma, prepare continuous and dense high-quality films, and at the same time realize the control of the content of target elements in the film, reduce the production cost of using alloy targets, and improve The transmission efficiency of the plasma, the increase of the deposition rate of the film and the reduction or even elimination of the adverse effects of large particle defects on the microstructure of the film, continuous dense deposition and performance, propose a combination of magnetic field and lined tapered tube and stepped tube composite Vacuum coating method

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