Method for photoelectrocatalytic oxidation of xylose by utilizing indium sulfide/ferronickel hydrotalcite composite film
A photoelectric catalysis, hydrotalcite technology, applied in electrodes, electrolysis process, electrolysis components, etc., can solve the problem of low reaction efficiency of photogenerated electrons and holes, and achieve to promote the separation of photogenerated electrons and holes, improve oxidation, excellent The effect of photocatalytic oxidation performance
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Embodiment 1
[0032] (1) Add 5.7 parts of citric acid monohydrate to 20 parts of deionized water, after fully dissolving, add 1 part of indium chloride, stir and dissolve to form an indium citrate complex solution. Dissolve 1.36 parts of thioacetamide in 20 parts of deionized water to form a thioacetamide solution. The thioacetamide solution was slowly added dropwise to the indium citrate complex solution under stirring to form a mixed solution, and transferred to the reaction kettle, and at the same time, a 10×30 mm FTO conductive glass cleaned with acetone and deionized water was placed vertically , sealed and reacted at 80° C. for 8 hours to obtain a conductive glass deposited with an indium sulfide film. The thickness of the indium sulfide film is 0.8-1 micron, and it is composed of cubic phase indium sulfide crystals with a particle size of 100-500 nm and sporadically distributed cubic phase indium sulfide crystals with a particle size of 1-2 microns;
[0033] (2) Dissolve 2.16 parts ...
Embodiment 2
[0036] (1) Add 5.7 parts of citric acid monohydrate to 20 parts of deionized water, after fully dissolving, add 1 part of indium chloride, stir and dissolve to form an indium citrate complex solution. Dissolve 1.36 parts of thioacetamide in 20 parts of deionized water to form a thioacetamide solution. The thioacetamide solution was slowly added dropwise to the indium citrate complex solution under stirring to form a mixed solution, and transferred to the reaction kettle, and at the same time, a 10×30 mm FTO conductive glass cleaned with acetone and deionized water was placed vertically , sealed and reacted at 80° C. for 8 hours to obtain a conductive glass deposited with an indium sulfide film. The thickness of the indium sulfide film is 0.8-1 micron, and it is composed of cubic phase indium sulfide crystals with a particle size of 100-500 nm and sporadically distributed cubic phase indium sulfide crystals with a particle size of 1-2 microns;
[0037] (2) Dissolve 2.16 parts ...
Embodiment 3
[0040] (1) Add 5.7 parts of citric acid monohydrate to 20 parts of deionized water, after fully dissolving, add 1 part of indium chloride, stir and dissolve to form an indium citrate complex solution. Dissolve 1.36 parts of thioacetamide in 20 parts of deionized water to form a thioacetamide solution. The thioacetamide solution was slowly added dropwise to the indium citrate complex solution under stirring to form a mixed solution, and transferred to the reaction kettle, and at the same time, a 10×30 mm FTO conductive glass cleaned with acetone and deionized water was placed vertically The sheet was sealed and reacted at 80°C for 8 hours to obtain a conductive glass deposited with an indium sulfide film. The thickness of the indium sulfide film is 0.8-1 micron, and it is composed of cubic phase indium sulfide crystals with a particle size of 100-500 nm and sporadically distributed cubic phase indium sulfide crystals with a particle size of 1-2 microns;
[0041] (2) Dissolve 2...
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