Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

X-shaped spoof surface plasmon waveguide with compact structure

A plasma and artificial surface technology, applied in the direction of waveguide, waveguide-type devices, circuits, etc., can solve the problems of reducing the size of waveguide structural units, increasing the waveguide bandwidth transmission surface wave confinement ability, etc., to achieve momentum matching and simple excitation methods Efficient, Small Size Effects

Active Publication Date: 2019-05-21
UNIV OF ELECTRONICS SCI & TECH OF CHINA
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Scholars have proposed many different forms of sub-wavelength structures to realize electromagnetic wave transmission in the microwave band, but there are still many challenges in reducing the size of the waveguide structural unit, increasing the bandwidth of the waveguide, and the ability of the waveguide to bind the transmitted surface waves.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • X-shaped spoof surface plasmon waveguide with compact structure
  • X-shaped spoof surface plasmon waveguide with compact structure
  • X-shaped spoof surface plasmon waveguide with compact structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0028] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0029] This embodiment provides a compact X-shaped artificial surface plasmon waveguide, its left view and top view are as follows figure 1 and figure 2 As shown, it is axisymmetrically distributed, including metal copper clad layer 1 and dielectric layer 2; the thickness of the metal copper clad layer is 0.035mm, the relative dielectric constant of the dielectric layer is equal to 2.67, and the thickness is 0.5mm, D y =41.52mm.

[0030] From left to right, the metal copper cladding is the first coplanar waveguide 3, the first transition structure 4, the X-shaped SSPPs structure 5 arranged periodically, the second transition structure and the second coplanar waveguide, where l 1 = 5mm, l 2 =50mm, l 3 =120mm.

[0031] The coplanar waveguide is a 50Ω coplanar waveguide, and its structure diagram is as follows image 3 As shown, from top to bottom a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
widthaaaaaaaaaa
Login to View More

Abstract

The invention discloses an X-shaped spoof surface plasmon waveguide with a compact structure, belongs to the technical field of spoof surface plasmons and waveguides and is applicable to a spoof surface plasmon device or circuit of a microwave band. The X-shaped spoof surface plasmon waveguide comprises a metal copper coating layer and a dielectric layer. The metal copper coating layer comprises afirst coplanar waveguide, a first transition structure, periodically arranged X-shaped SSPPs (Spoof Surface Plasmon Polaritons) structures, a second transition structure and a second coplanar waveguide which are set in sequence from left to right. According to the X-shaped spoof surface plasmon waveguide, excitation is carried out through adoption of the coplanar waveguides, and the coplanar waveguides and the X-shaped SSPPs structures are combined through adoption of the transition structures, so an X-shaped uniconductor waveguide based on a spoof surface plasmon structure is obtained. A simulation result indicates that in a working band of 2.5-12.6GHz, a reflection coefficient of an input end of the structure is smaller than -10dB, and a transmission coefficient of an output end is greater than -3dB; and in a whole working band, group delay is smaller than 2.6ns.

Description

technical field [0001] The invention belongs to the technical field of artificial surface plasma and waveguide, in particular to an X-shaped artificial surface plasma waveguide with a compact structure, which is suitable for artificial surface plasma devices or circuits in the microwave frequency band. Background technique [0002] For a long time, people have been committed to studying the propagation process of electromagnetic waves, and constraining and regulating electromagnetic waves by designing a series of components that can meet different needs. Research in recent years has shown that artificial surface plasmons can be connected with knowledge in the fields of terahertz technology, microwave technology, metamaterials, and photonic crystals, and have broad application prospects, such as highly integrated optical circuits, super-resolution imaging and data storage etc. The new generation of communication technology requires smaller size and spatial layout of componen...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01P3/00
Inventor 王晓华万晔聂荣邹
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com