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Method for processing copper-graphene composite nanometer pattern through electron beams

A technology of graphene compounding and electron beam processing, which is applied in nanotechnology, photosensitive material processing, photolithographic exposure devices, etc., can solve the problems of no ultra-small-scale nanocomposite material patterning, high processing cost, and harsh processing conditions. , to achieve excellent mechanical properties and electrical and thermal conductivity, reduce production costs, and reduce the effects of processing procedures

Inactive Publication Date: 2019-05-17
杭州欧克液压科技有限公司
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  • Application Information

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Problems solved by technology

The traditional processing method has cumbersome steps, harsh processing conditions, high processing cost, especially the inability to process composite nano-patterns
[0003] Copper and copper alloys have good electrical and thermal conductivity, and have been widely used in integrated circuits, micro / nano electromechanical systems, chemical industry and other fields, but their strength is low and their high temperature resistance to deformation is low, thus limiting their further development
But so far no one has studied the patterning of nanocomposites at extremely small scales.

Method used

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  • Method for processing copper-graphene composite nanometer pattern through electron beams
  • Method for processing copper-graphene composite nanometer pattern through electron beams
  • Method for processing copper-graphene composite nanometer pattern through electron beams

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specific Embodiment

[0038] (1) S101 provides the substrate and performs ultrasonic cleaning and drying: select a single crystal silicon substrate, and ultrasonically clean it with acetone for 5 minutes, then ultrasonically clean it with isopropanol for 5 minutes, and then dry the sample with nitrogen;

[0039] (2) S102 Copper naphthenate is plated on the substrate: first drop the copper naphthenate solution on the substrate and spin-coat with 1000 revolutions / second for 5 seconds and then spin-coat with 4000 revolutions / second for 60 seconds, the result Schematic such as figure 2 shown.

[0040] (3) S103 electron beam exposure sample: Use the electron beam exposure equipment Raith 150-Two to expose the sample in step 2. During the exposure process, the high voltage of the equipment is 30KV, and the beam current is 200PA; the schematic diagram of the result is as follows image 3 shown.

[0041] (4) S104 develops the sample with toluene: develop the exposed sample in a toluene solution for 60 s...

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Abstract

The invention discloses a method for processing a copper-graphene composite nanometer pattern through electron beams. The method comprises the steps: firstly, a layer of copper naphthenate thin film is rotatably smeared on a provided substrate; a sample is exposed through an electron beam exposure technology and developed, and then a preset copper naphthenate nanometer pattern is obtained; and then the sample is annealed to obtain the nanometer pattern of a copper-graphene composite material. The defect that traditional micronano processing cannot manufacture the composite material nanostructure pattern with the extremely small feature size is overcome, and meanwhile, metal deposition is not needed, so that the production cost is lowered.

Description

technical field [0001] The invention relates to the field of micro-nano manufacturing, in particular to a method for processing copper-graphene composite nano-patterns with electron beams. Background technique [0002] With the rapid development of nanotechnology, nano-optics and nano-electronics, the research of electron beam exposure nano-processing technology is particularly important, and the traditional preparation method of nano-structure graphics is mainly divided into three steps: (1) using electron beam processing technology Defining the nano-pattern on the photoresist; (2) depositing a layer of functional material on the photoresist nano-pattern structure or directly etching; (3) removing the remaining photoresist to complete the transfer of the nano-structure pattern. The traditional processing method has cumbersome steps, harsh processing conditions and high processing cost, especially it cannot process composite nano-patterns. [0003] Copper and copper alloys ...

Claims

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Application Information

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IPC IPC(8): G03F7/20G03F7/40B82Y40/00
Inventor 张志平陶守林董海健李辉金胜利郭斌
Owner 杭州欧克液压科技有限公司
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