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TiAlN hard coating and preparing method and application thereof

A technology of hard coating and cemented carbide substrate, which is applied in the field of material science and engineering, can solve the problems of element diffusion and lack of technical process, and achieve optimized process parameters, good high temperature stability and age hardening effect, and film-base bonding force and the effect of improving the thermal stability at high temperature

Active Publication Date: 2019-04-23
GUANGDONG UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Metal ion etching technology can improve the film-base bonding force of cemented carbide tool coating, but there is still a lack of corresponding technology for the diffusion of Co element in high-speed dry cutting

Method used

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  • TiAlN hard coating and preparing method and application thereof
  • TiAlN hard coating and preparing method and application thereof
  • TiAlN hard coating and preparing method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] The A1 target position of the PVD vacuum coating machine is equipped with a Zr target. The cemented carbide substrate (WC-8wt.% Co-4wt.% TiC) was polished, then ultrasonically cleaned with acetone and absolute ethanol for 60 minutes, dried with general nitrogen, and then placed on a vacuum chamber tray. Turn on the heater to raise the temperature to 500°C, turn on the vacuum system during the heating process, and evacuate the chamber to a vacuum degree of 5.0×10 -3 Below Pa. Set the temperature to 350°C, the Ar gas flow rate to 300sccm, the control chamber pressure to 2.0Pa, and the workpiece turret bias to -800V to perform glow cleaning on the cemented carbide substrate, and the glow cleaning time is 30min. Adjust the Ar gas flow to 70sccm, control the cavity pressure to 0.55Pa, keep the bias voltage of the workpiece turret at -800V, ignite the Zr target, and set the target current to 105A, and the ion etching lasts for a short time. After the ion etching is complete...

Embodiment 2

[0037] The A1 target position of the PVD vacuum coating machine is equipped with a Zr target. The cemented carbide substrate (WC-8wt.% Co-4wt.% TiC) was polished, then ultrasonically cleaned with acetone and absolute ethanol for 60 minutes, dried with general nitrogen, and then placed on a vacuum chamber tray. Turn on the heater to raise the temperature to 500°C, turn on the vacuum system during the heating process, and evacuate the chamber to a vacuum degree of 5.0×10 -3Below Pa. Set the temperature to 350°C, the Ar gas flow rate to 300sccm, the control chamber pressure to 2.0Pa, and the workpiece turret bias to -800V to perform glow cleaning on the cemented carbide substrate, and the glow cleaning time is 30min. Adjust the Ar gas flow to 70sccm, control the cavity pressure to 0.55Pa, keep the bias voltage of the workpiece turret at -800V, ignite the Zr target, set the target current to 105A, and continue the ion etching for a medium time. After the ion etching is completed...

Embodiment 3

[0039] The A1 target position of the PVD vacuum coating machine is equipped with a Zr target. The cemented carbide substrate (WC-8wt.% Co-4wt.% TiC) was polished, then ultrasonically cleaned with acetone and absolute ethanol for 60 minutes, dried with general nitrogen, and then placed on a vacuum chamber tray. Turn on the heater to raise the temperature to 500°C, turn on the vacuum system during the heating process, and evacuate the chamber to a vacuum degree of 5.0×10 -3 Below Pa. Set the temperature to 350°C, the Ar gas flow rate to 300sccm, the control chamber pressure to 2.0Pa, and the workpiece turret bias to -800V to perform glow cleaning on the cemented carbide substrate, and the glow cleaning time is 30min. Adjust the Ar gas flow to 70sccm, control the cavity pressure to 0.55Pa, keep the bias voltage of the workpiece turret at -800V, ignite the Zr target, and set the target current to 105A, and the ion etching lasts for a long time. After the ion etching is completed...

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Abstract

The invention belongs to the field of coating materials, and discloses a TiAlN hard coating and a preparing method thereof. The method comprises the steps that polishing ultrasonic cleaning is conducted on a hard alloy matrix, after blow-drying and dust removing, the hard alloy matrix is placed in a film plating machine cavity, the cavity is heated, the temperature is increased to 400-600 DEG C, the vacuum degree of the cavity is 1-6 x 10 <-3> Pa, cooling is conducted to 300-400 DEG C, and the temperature is kept constant; inflation of Ar gas is conducted, bias pressure is loaded to a workpiece rotating stand, and the surface of the matrix is subjected to glow cleaning; the flow of the Ar gas is adjusted, the air pressure of the cavity is controlled, a Zr target is ignited through the cathode arc evaporative deposition method, the current of the Zr target and the bias pressure of the workpiece rotating stand are set, and metal ion etching is conducted on the matrix; an Ar gas valve isclosed, inflation of N2 is conducted, the air pressure of the cavity and the bias pressure of the workpiece rotating stand are adjusted, a Ti50Al50 target is ignited, the current of the Ti50Al50 target is adjusted, and the TiAlN hard coating is deposited on the surface of the matrix. The TiAlN hard coating has high heat stability and matrix bonding force.

Description

technical field [0001] The invention belongs to the technical field of material science and engineering, and more specifically relates to a TiAlN hard coating and a preparation method and application thereof. Background technique [0002] The rapid development of advanced manufacturing technology (ultra-precision machining, high-speed machining, etc.) has led to the rapid development of modern cutting technology in the direction of high precision, high efficiency, energy saving and environmental protection. Cemented carbide is a cermet-type tool material prepared by powder metallurgy with refractory metal compounds (WC, TiC, TaC, etc.) as the matrix and transition metals (Co, Fe, Ni, etc.) as the binder phase. , because of its excellent properties such as good strength, hardness and wear resistance, it is favored by modern cutting technology and is widely used as a base material for metal cutting tools. Coating a layer of wear-resistant protective coating (such as TiAlN har...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/02C23C14/06C23C14/32
CPCC23C14/0021C23C14/022C23C14/0641C23C14/325
Inventor 王启民彭滨许雨翔刘喆人张权
Owner GUANGDONG UNIV OF TECH
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