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Preparation method of transition state oxidation nickel-chromium film layer and toughened low-emissivity coated glass containing transition state oxidation nickel-chromium film layer

A low-emission coating, nickel-chromium oxide technology, used in sputtering, coating, ion implantation, etc., can solve the problems of waste of financial and material resources, affect the appearance and image, delivery troubles, etc., to improve the transmission rate. Emissivity, good appearance color, the effect of reducing emissivity

Active Publication Date: 2019-01-04
吴江南玻华东工程玻璃有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As a building material, glass curtain wall or glass doors and windows are equivalent to the coat of the building. This color difference will seriously affect the appearance image. If you complain about replacing the glass, it will lead to a huge waste of financial and material resources
At the same time, patches caused by chromatic aberration must also adopt the "coating-tempering" sequential process. There is still a risk of chromatic aberration in the patching process, which leads to delivery troubles

Method used

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  • Preparation method of transition state oxidation nickel-chromium film layer and toughened low-emissivity coated glass containing transition state oxidation nickel-chromium film layer
  • Preparation method of transition state oxidation nickel-chromium film layer and toughened low-emissivity coated glass containing transition state oxidation nickel-chromium film layer
  • Preparation method of transition state oxidation nickel-chromium film layer and toughened low-emissivity coated glass containing transition state oxidation nickel-chromium film layer

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preparation example Construction

[0026] A method for preparing a transition-state nickel-chromium oxide film layer, comprising the following steps: using a NiCr alloy target material, under the control of a DC power supply or a DC pulse power supply, maintaining the background vacuum degree of the magnetron sputtering coating equipment to be better than 5 ×10 -4 Pa, at the process atmosphere point, the reactive sputtering method is used to deposit sequentially on the surface of the previous film layer. The above process atmosphere point corresponds to an argon-oxygen atmosphere, and the flow ratio of argon and oxygen is 8 / 1 -12 / 1, the transition state nickel-chromium oxide film is obtained. The thickness of the transition state nickel-chromium oxide film layer is preferably 1.5-5 nm.

[0027] The flow rate ratio of argon and oxygen corresponding to the above process atmosphere point is obtained by the following method:

[0028] Keep the background vacuum of the magnetron sputtering coating equipment better ...

Embodiment 1

[0044] A toughened double-silver low-emissivity coated glass, comprising a glass substrate 100 and a composite film layer 200 plated on the surface of the glass substrate 100, the film layer structure of the composite film layer 200 and the thickness of each film layer are as follows:

[0045] Silicon nitride layer (22nm) / zinc oxide layer (10nm) / silver layer (10nm) / first transition state nickel-chromium oxide film layer (1.5nm) / zinc tin oxide layer (30nm) / silicon nitride layer (20nm) / zinc oxide layer (15nm) / silver layer (17nm) / second transition state nickel-chromium oxide film layer (5nm) / zinc oxide layer (10nm) / silicon nitride layer (24nm);

[0046] The above-mentioned first transition state nickel-chromium oxide film layer and the second transition state nickel-chromium oxide film layer are prepared according to the preparation method of the transition state nickel-chromium oxide film layer of the present invention. In this example, the first transition state nickel-chromium...

Embodiment 2

[0055] A temperable triple-silver low-emissivity coated glass, comprising a glass substrate 100 and a composite film layer 200 coated on the surface of the glass substrate 100, the film layer structure of the composite film layer 200 and the thickness of each film layer are as follows:

[0056] Silicon nitride (30nm) / zinc oxide (12nm) / silver (10nm) / first transition state nickel-chromium oxide layer (2nm) / zinc tin oxide (20nm) / silicon nitride (25nm) / zinc oxide (10nm) / Silver (12nm) / Second transition state nickel-chromium oxide layer (3nm) / Zinc tin oxide (30nm) / Silicon nitride (35nm) / Zinc oxide (10nm) / Silver (8nm) / Third transition state nickel oxide Chromium film (3nm) / zinc tin oxide (15nm) / silicon nitride (22nm);

[0057] The first transition state nickel-chromium oxide film layer, the second transition state nickel-chromium oxide film layer and the third transition state nickel-chromium oxide film layer are prepared according to the preparation method of the transition state n...

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Abstract

The invention relates to the technical field of glass production, in particular to a preparation method of a transition state oxidation nickel-chromium film layer and toughened low-emissivity coated glass containing the transition state oxidation nickel-chromium film layer, the preparation method comprises the following steps: by using a NiCr alloy target material, under the control of a direct current power supply or a direct pulse power supply, a background vacuum degree of a magnetron sputtering coating device is kept to be better than 5*10 <-4> Pa, deposition is sequentially carried out onthe surface of a last layer of film at a processing atmosphere point by using a reactive sputtering mode, wherein the processing atmosphere point corresponds to argon and oxygen atmosphere, the flowratio of argon gas and oxygen gas is 8 / 1-12 / 1, the transition state oxidation nickel-chromium film layer is obtained. The transition state oxidation nickel-chromium film layer can greatly reduce the chromatic aberration before and after the tempering of the glass when applied in toughened low-emissivity coated glass as a barrier layer, the color control in a production process is facilitated, andthe transmittance is greatly improved, and the transmitted color is more neutral.

Description

technical field [0001] The invention relates to the technical field of glass production, in particular to a preparation method of a transition-state nickel-chromium oxide film layer and a temperable low-radiation coated glass containing the transition-state nickel-chromium oxide film layer. Background technique [0002] Off-line low-e glass with silver as the functional layer has been widely used in architectural glass. Toughened low-e glass has the characteristics of being able to be processed in different places. It separates the coated large plate from the subsequent tempering, hollowing, etc. convenience. Therefore, it is widely used in residential doors and windows and some public construction projects. [0003] The film layer structure of low-emissivity glass has gradually become stable and mature with years of development. The thickness of the Ag film on the functional layer is generally 8-20nm, which is easily oxidized or vulcanized during the coating process and su...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/08C03C17/36
CPCC03C17/3626C03C17/3644
Inventor 唐晶梁干武瑞军
Owner 吴江南玻华东工程玻璃有限公司
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