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Single-silicon nanowire fluorescent chemical sensor for detecting hypochlorite and preparation method and application of single-silicon nanowire fluorescent chemical sensor

A technology of chemical sensors and silicon nanowires, applied in the field of fluorescent chemical sensors, can solve problems such as inaccurate understanding and achieve good application prospects

Active Publication Date: 2018-11-30
TECHNICAL INST OF PHYSICS & CHEMISTRY - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

But based on some limitations of the current research, the traditional cell test is generally the response of the cell population, and the average signal of the cell population is used as the sensor's response to the cell
But in fact, there are huge differences between individuals of cells, so the average signal may lead to some inaccurate understanding of the physiological process of cells

Method used

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  • Single-silicon nanowire fluorescent chemical sensor for detecting hypochlorite and preparation method and application of single-silicon nanowire fluorescent chemical sensor
  • Single-silicon nanowire fluorescent chemical sensor for detecting hypochlorite and preparation method and application of single-silicon nanowire fluorescent chemical sensor
  • Single-silicon nanowire fluorescent chemical sensor for detecting hypochlorite and preparation method and application of single-silicon nanowire fluorescent chemical sensor

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preparation example Construction

[0045] In a second aspect, the present invention provides a method for preparing a single silicon nanowire fluorescent chemical sensor for detecting hypochlorite, comprising the following steps:

[0046] 1) Preparation of silicon nanowire arrays with Si-OH bonds on the surface: boil the silicon nanowire arrays in a mixed solution of concentrated sulfuric acid and 30% hydrogen peroxide solution with a volume ratio of 2:1 to 4:1 at 90°C for 45min to 1.5h, cool to room temperature, wash with water until neutral; soak in a mixed solution of water, 30% hydrogen peroxide solution and ammonia water with a volume ratio of 3:1:1~6:1:1 for 2.5~4h, wash with water until neutral , dried in vacuum to obtain a silicon nanowire array with Si-OH bonds on the surface;

[0047] 2) Synthesis of IR780 derivatives: Add IR780 and 3-aminopropyltriethoxysilane to an organic solvent, heat to 120°C under the protection of an inert gas, react at a constant temperature for 30 minutes, evaporate the organ...

Embodiment 1

[0066] 1) Take n(100) silicon wafers of 0.5cm×3cm, and ultrasonically clean them with acetone, ethanol, and distilled water for 10 minutes respectively, take out the cleaned silicon wafers, and place them in AgNO with a concentration of 5mmol / L. 3 and 4.8mol / L HF mixed aqueous solution, after soaking for 8min, take it out and put it into 200mL containing 4.8mol / L HF and 0.2mol / L H 2 o 2In the mixed aqueous solution, the system was kept warm in a water bath at 50°C; after 2 hours, the silicon chip was taken out and placed in a mixture containing 15mL of concentrated hydrochloric acid (36% in mass concentration) and 5mL of concentrated nitric acid (65% in mass concentration), and soaked for 1h Finally, the silicon wafer was taken out, rinsed with distilled water, and then dried naturally to obtain a silicon nanowire array composed of silicon nanowires. The silicon nanowires in the silicon nanowire array have a diameter of 100-400nm and a length of about 200μm. The SEM photo of ...

Embodiment 2

[0072] 1) Take n(100) silicon wafers of 0.5cm×3cm, and ultrasonically clean them with acetone, ethanol, and distilled water for 30 minutes, and place the cleaned silicon wafers in AgNO with a concentration of 3mmol / L. 3 Soak in a mixed aqueous solution of 2mol / L HF and 2mol / L HF for 10min, take out the silicon chip and immerse it in 200mL containing 2mol / L HF and 0.05mol / L H 2 o 2 In the mixed aqueous solution, the system was kept warm in a water bath with a temperature of 60°C. After 150 minutes, the silicon chip was taken out and put into 15 mL of concentrated hydrochloric acid (36% in mass concentration):concentrated nitric acid (65% in mass concentration) with a volume ratio of 3: 1 in the mixed solution, soaked for 0.5h, took out the silicon chip, rinsed with distilled water and dried naturally to obtain a silicon nanowire array composed of silicon nanowires;

[0073] 2) At room temperature, cook the silicon nanowire array in 10 mL of concentrated sulfuric acid: 30% hydr...

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Abstract

The invention discloses a single-silicon nanowire fluorescent chemical sensor for detecting hypochlorite and a preparation method and application of the single-silicon nanowire fluorescent chemical sensor. The firstly disclosed single-silicon nanowire fluorescent chemical sensor for detecting hypochlorite is a single silicon nanowire with an IR780 derivative-modified surface. The invention furtherdiscloses the preparation method and application of the single-silicon nanowire fluorescent chemical sensor. The single-silicon nanowire fluorescent chemical sensor for detecting hypochlorite is fixed at the tip of a capillary microneedle, and positioning of the interior of a single cell can be achieved by means of a micro-operating system and a laser scanning confocal microscope, so that detection of hypochlorite in the single cell is achieved finally, and the problem of drifting of nanoparticles is solved well through physical positioning of the silicon nanowire; the single-silicon nanowirefluorescent chemical sensor for detecting hypochlorite has a potential value in revealing the role of hypochlorite in physiology and pathology, and has a good application prospect.

Description

technical field [0001] The invention relates to the field of fluorescent chemical sensors. More specifically, it relates to a single silicon nanowire fluorescent chemical sensor for detecting hypochlorite, its preparation method and application. Background technique [0002] Hypochlorous acid is an important reactive oxygen species that plays a vital role in protecting the human body from pathogens. Hypochlorous acid is weakly acidic and will partially dissociate into hypochlorite ions under physiological pH conditions. Endogenous hypochlorite (hypochlorous acid / hypochlorite ion) is produced by the peroxidation of chloride ions catalyzed by myeloperoxidase in white blood cells such as neutrophils, monocytes, or macrophages . It has been reported that abnormal hypochlorite concentration due to changes in myeloperoxidase levels is associated with various diseases such as arthritis, cardiovascular disease, and cancer. Therefore, monitoring the concentration of hypochlorite ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09K11/02C09K11/59G01N21/64
CPCC09K11/025C09K11/59G01N21/6428G01N2021/6432
Inventor 穆丽璇曹星星师文生
Owner TECHNICAL INST OF PHYSICS & CHEMISTRY - CHINESE ACAD OF SCI
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