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Method for nano-imprinting based on centrifugal force, and prepared polymer micro-nano structure

A technology of nano-imprinting and micro-nano structure, which is applied in the photoplate-making process of pattern surface, photomechanical equipment, micro-lithography exposure equipment, etc., which can solve the problem of high cost and achieve low cost, simple process and wide applicability Effect

Inactive Publication Date: 2018-11-23
JIANGXI UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The first purpose of the present invention is to provide a nanoimprinting method based on centrifugal force, which has a simple process and does not require expensive equipment, so as to solve the technical problems of high cost in the prior art

Method used

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  • Method for nano-imprinting based on centrifugal force, and prepared polymer micro-nano structure
  • Method for nano-imprinting based on centrifugal force, and prepared polymer micro-nano structure
  • Method for nano-imprinting based on centrifugal force, and prepared polymer micro-nano structure

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Effect test

Embodiment 1

[0077] The steps of the centrifugal force-based nanoimprint method described in this embodiment are as follows:

[0078] (1) Spin-coat the UV-curable photoresist (manufacturer: Obducat, model: STU220) on the porous alumina template with a spin-coating thickness of 0.2-2 μm, such as figure 1 shown;

[0079] (2) Then place the porous alumina template spin-coated with polymer in a centrifuge device, heat up to 70°C; then, set the rotation speed at 8000rpm / min, keep the temperature for 10min, and then expose to ultraviolet light for 2min. figure 2 shown;

[0080] (3) After ultraviolet exposure, stop heating, turn off the centrifuge equipment, cool down to room temperature, dissolve and remove the porous alumina template with sodium hydroxide solution, and rinse and dry repeatedly with deionized water to obtain the micro-nano structure of the polymer—that is, polymerization Nanopillar array structures of objects, such as image 3 shown.

Embodiment 2

[0082] The steps of the centrifugal force-based nanoimprint method described in this embodiment are as follows:

[0083] (1) Spin-coat the UV-curable photoresist on the porous alumina template, and the spin-coating thickness is 2-5 μm;

[0084] (2) Then place the porous alumina template spin-coated with polymer in a centrifuge device, heat up to 55°C; then, set the rotation speed at 20000rpm / min, keep the temperature for 5min, and then expose to ultraviolet light for 2min;

[0085] (3) After ultraviolet exposure, stop heating, turn off the centrifuge equipment, cool down to room temperature, dissolve and remove the porous alumina template with sodium hydroxide solution, and rinse and dry repeatedly with deionized water to obtain the micro-nano structure of the polymer—that is, polymerization nanopillar array structure.

Embodiment 3

[0087] The steps of the centrifugal force-based nanoimprint method described in this embodiment are as follows:

[0088] (1) Spin-coat the UV-curable photoresist on the porous alumina template, and the spin-coating thickness is 0.2-2 μm;

[0089] (2) Then place the porous alumina template spin-coated with polymer in a centrifuge device, heat up to 85°C; then, set the rotation speed at 7000rpm / min, keep the temperature for 15min, and then expose to ultraviolet light for 2min;

[0090] (3) After ultraviolet exposure, stop heating, turn off the centrifuge equipment, cool down to room temperature, dissolve and remove the porous alumina template with sodium hydroxide solution, and rinse and dry repeatedly with deionized water to obtain the micro-nano structure of the polymer—that is, polymerization nanopillar array structure.

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Abstract

The invention relates to the technical field of micro-nano manufacturing, in particular to a method for nano-imprinting based on centrifugal force, and a prepared polymer micro-nano structure. The method for nano-imprinting based on the centrifugal force comprises the following steps that a polymer is placed on a micro-nano structure mould plate, heated, and subjected to centrifugal filling; and ultraviolet exposure is conducted to enable the polymer to be solidified and demoulded. Using of expensive equipment is not needed, gaps of the micro-nano structure mould plate are fully filled with the polymer through the centrifugal force, and thus replication of the micro-nano structure is achieved; and under the heating condition, the polymer has sufficient fluidity, the gaps of the micro-nanostructure mould plate are filled with the polymer through the centrifugal effect, then ultraviolet exposure is conducted, thus the polymer is solidified to be formed and demoulded, that is, nano-imprinting based on the centrifugal force is completed.

Description

technical field [0001] The invention relates to the technical field of micro-nano manufacturing, in particular to a nano-imprint method based on centrifugal force and a prepared polymer micro-nano structure. Background technique [0002] Nanoimprint lithography is capable of fabricating large-scale three-dimensional micro- or nano-scale structures with high yield and high resolution. At present, there are a variety of nanoimprinting processes, in addition to the commonly used thermal embossing and UV nanoimprinting, there are micro-contact imprinting, roller imprinting and so on. [0003] Thermal nanoimprint lithography was proposed in 1995 by Stephen.Y.Chou et al. of Princeton University. This technology uses a nanoscale template to imprint a polymer that is spin-coated on the wafer surface, thereby realizing the transfer and replication of graphics. Unlike traditional photolithography, nanoimprinting can fabricate nanostructures without the use of photons, electrons or i...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00G03F7/20
CPCG03F7/0002G03F7/2002
Inventor 赵文宁韩修训方毅罗烈升
Owner JIANGXI UNIV OF SCI & TECH
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