Method for preparing Cu doped dilute magnetic semiconductor thin film
A dilute magnetic semiconductor and thin film technology, applied in the application of magnetic film to substrate, ion implantation plating, coating, etc., to achieve the effect of strong operability, high quality and high density
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[0014] The invention provides a method for preparing a Cu-doped dilute magnetic semiconductor film, comprising the following steps:
[0015] S1. Clean the substrate to remove oil and impurities on the surface of the substrate; the substrate can be an ordinary glass substrate;
[0016] S2. Using ion beam deposition equipment and magnetron sputtering equipment, the substrate is placed in the vacuum chamber of the ion beam deposition equipment, and a Cu layer with a thickness of 10 nm is deposited on the surface of the substrate by the ion beam;
[0017] S3. The substrate deposited with the Cu layer is transferred into the vacuum chamber of the magnetron sputtering equipment, the Al target is used as the sputtering target, the working gas Ar, and the reaction gas N 2 , Al target adopts DC power supply and RF power supply at the same time, Al target DC power 80W, RF power 70W, working pressure 0.6Pa, Ar flow rate 15sccm, N 2 The flow rate is 8sccm, the sputtering time is 30min, a...
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