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Method for preparing Cu doped dilute magnetic semiconductor thin film

A dilute magnetic semiconductor and thin film technology, applied in the application of magnetic film to substrate, ion implantation plating, coating, etc., to achieve the effect of strong operability, high quality and high density

Inactive Publication Date: 2018-10-12
(CNBM) BENGBU DESIGN & RES INST FOR GLASS IND CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Because it has both semiconductor and magnetic properties, that is, the application of two degrees of freedom of electronic charge and spin in one material at the same time, it has attracted widespread attention from scientific researchers and is still in the research stage.

Method used

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Embodiment Construction

[0014] The invention provides a method for preparing a Cu-doped dilute magnetic semiconductor film, comprising the following steps:

[0015] S1. Clean the substrate to remove oil and impurities on the surface of the substrate; the substrate can be an ordinary glass substrate;

[0016] S2. Using ion beam deposition equipment and magnetron sputtering equipment, the substrate is placed in the vacuum chamber of the ion beam deposition equipment, and a Cu layer with a thickness of 10 nm is deposited on the surface of the substrate by the ion beam;

[0017] S3. The substrate deposited with the Cu layer is transferred into the vacuum chamber of the magnetron sputtering equipment, the Al target is used as the sputtering target, the working gas Ar, and the reaction gas N 2 , Al target adopts DC power supply and RF power supply at the same time, Al target DC power 80W, RF power 70W, working pressure 0.6Pa, Ar flow rate 15sccm, N 2 The flow rate is 8sccm, the sputtering time is 30min, a...

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Abstract

The invention discloses a method for preparing a Cu doped dilute magnetic semiconductor thin film. The method comprises the following steps of 1, a substrate is cleaned, oil stains and impurities on the surface of the substrate are removed; 2, an ion beam deposition equipment and a magnetron sputtering equipment are adopted, the substrate is placed in a vacuum chamber of the ion beam deposition equipment, and a Cu layer is deposited on the surface of the substrate through the ion beam; 3, the substrate deposited with the Cu layer is transferred into a vacuum chamber of the magnetron sputteringequipment, an Al target is adopted as a sputtering target material, a working gas Ar, a reaction gas N2, and an AlN layer on the surface of the Cu layer is sputtered to obtain a composite thin film;4, a sample table for heating magnetron sputtering equipment to place substrate to 500 DEG c, and annealing treatment on the composite thin film obtained in the step s3 to finally obtain the Cu dopeddilute magnetic semiconductor thin film. The method is simple in process, controllable and high in operability, the sample table heating system is used for heating the sample, so that the effect of re-uniformly distributing the doped cu in the thin film is achieved, meanwhile, the crystallization quality of the whole thin film can be improved.

Description

technical field [0001] The invention relates to the technical field of functional thin films, in particular to a method for preparing Cu-doped dilute magnetic semiconductor thin films. Background technique [0002] Diluted magnetic semiconductors (DMS) refer to magnetic semiconductors formed by replacing some atoms in non-magnetic semiconductors with transition metals (TM). Because the doped impurity concentration is generally not high, the magnetism is relatively weak, so it is called a dilute magnetic semiconductor, or a semi-magnetic semiconductor. Because it has both semiconductor and magnetic properties, that is, the two degrees of freedom of electronic charge and spin are applied in one material at the same time, which has attracted widespread attention of scientific researchers and is still in the research stage. Contents of the invention [0003] The object of the present invention is to provide a method for preparing Cu-doped dilute magnetic semiconductor thin fi...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/22C23C14/58C23C14/14C23C14/06H01F41/18
CPCC23C14/0036C23C14/0617C23C14/14C23C14/221C23C14/35C23C14/5806H01F41/18
Inventor 沈洪雪姚婷婷杨勇李刚
Owner (CNBM) BENGBU DESIGN & RES INST FOR GLASS IND CO LTD
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