Preparation of (cu,fe) by a magnetron sputtering method 3 o 4 Method of spinel coating and its application
A technology of spinel coating and magnetron sputtering, which is applied in the direction of coating, sputtering coating, metal material coating process, etc., can solve the problems of difficult control of composition and thickness, slow film preparation rate and substrate bonding force. Poor and other problems, to achieve the effect of improving oxidation resistance and electrical conductivity, compact structure, and improving adhesion
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Embodiment 1
[0026] Embodiment 1: This embodiment is based on SUS 430 stainless steel (Cr: 16mass%)
[0027] (1) Pretreatment: Polish the surface of the SUS 430 stainless steel substrate with 240#, 400#, and 600# SiC water-grinding paper in sequence, and perform grinding and chamfering treatment; sandblasting is performed after the substrate is polished, and the pressure range of compressed air during sandblasting 0.5MPa, the sand used is silica; after the substrate is sandblasted, it is ultrasonically cleaned with acetone for 15 minutes; the cleaned sample is pre-oxidized in air at 800°C for 100 hours, and a Cr with a thickness of about 2 μm is formed on the surface of the stainless steel. 2 o 3 and (Mn,Cr) 3 o 4 oxide layer;
[0028] (2) Sputtering deposition to obtain alloy coating: take Cu-Fe alloy target (33% Cu content, 67% Fe content) as cathode, substrate as anode, sputtering current 3.0A, sputtering pressure 0.15Pa, sputtering The sputtering temperature is 200°C, the sputterin...
Embodiment 2
[0032] Example 2 This example uses crofer22APU stainless steel as the substrate (Cr: 22mass%) (1) Pretreatment: use 240#, 400#, 600# SiC water abrasive paper to polish the surface of the crofer22APU stainless steel substrate in sequence, and perform grinding and chamfering treatment ;Sandblasting is carried out after the substrate is polished, the pressure range of compressed air is 0.3MPa during sandblasting, and the sand particles used are silica; after the substrate is sandblasted, it is ultrasonically cleaned with acetone for 10min; the cleaned sample is placed in air at 650°C Pre-oxidize for 150 hours to form Cr with a thickness of about 2.5 μm on the surface of stainless steel 2 o 3 and (Mn,Cr) 3 o 4 oxide layer;
[0033] (2) Sputtering deposition to obtain an alloy coating: the Cu-Fe alloy target (30% Cu content, 70% Fe content) is used as the cathode, the substrate is used as the anode, the sputtering current is 3.0A, and the sputtering pressure is 0.10Pa. The sput...
Embodiment 3
[0035] Embodiment 3 This embodiment takes AISI 430 stainless steel as the substrate (Cr: 18mass%)
[0036] (1) Pretreatment: use 240#, 400#, 600# SiC water abrasive paper to polish the surface of AISI 430 stainless steel substrate in sequence, and perform grinding and chamfering treatment; after the substrate is polished, sandblasting is performed, and the pressure range of compressed air during sandblasting 0.4MPa, the sand used is silica; after the substrate is sandblasted, it is ultrasonically cleaned with acetone for 13 minutes; the cleaned sample is pre-oxidized in air at 750°C for 200 hours, and a Cr with a thickness of about 3 μm is formed on the surface of the stainless steel. 2 o 3 and (Mn,Cr) 3 o 4 oxide layer;
[0037] (2) Sputtering deposition to obtain alloy coating: take Cu-Fe alloy target (40% Cu content, 60% Fe content) as cathode, substrate as anode, sputtering current 3.0A, sputtering pressure 0.13Pa, sputtering The sputtering temperature was 200°C, the s...
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