Preparation method of crystalline organic thin film transistor controlled through crystalline solvent
A thin-film transistor and solvent-regulated technology, which is applied in semiconductor/solid-state device manufacturing, electric solid-state devices, semiconductor devices, etc., can solve problems such as waste of energy, amorphous films, cumbersome processing operations, etc., to improve efficiency and film-forming performance Good, time and energy saving effect
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[0008] Si / SiO with a size of 1.5 cm × 1.5 cm 2 The base substrate (2) is first wiped with a cotton ball wetted with acetone solution, rinsed with acetone solution after wiping, then wiped with a cotton ball wetted with ethanol solution, rinsed with ethanol solution after wiping, and then rinsed with distilled water. Washed Si / SiO 2 Substrate The substrate (2) was blown dry with nitrogen gas, and dried in an oven at a temperature of 120°C. Treated Si / SiO 2 The base substrate (2) was taken out, and TCB was dissolved in chloroform solvent at a volume fraction of 1% to form a TCB solution (1) and added dropwise to Si / SiO 2 The substrate (2) is placed on the substrate until the solution covers the substrate. After 15 s, when TCB just started to form a small amount of crystals (3), 40 μL of rubrene solution (4) dissolved in chloroform solvent was added dropwise. With the volatilization of the chloroform solvent (5), the TCB first forms a uniform and directional substrate modific...
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