Composite coating for die-casting mold and preparation method thereof
A technology of composite coating and die-casting mold, which is applied in the direction of coating, metal material coating process, vacuum evaporation plating, etc., to achieve good surface hardness, improve service life and reduce mold deformation
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Embodiment 1
[0065] by H 13 The working surface of the die-casting mold base made of die steel material is polished, and the mold base is degreased, dewaxed, cleaned and dried by ultrasonic cleaning.
[0066] Place the cleaned and dried mold base in the cavity of the vacuum cathode ion plating equipment, heat to 400 degrees, and vacuumize to 5×10 -3 Pa, feed Ar to maintain the air pressure at 1.2Pa, turn on the ion source of the anode layer, the current is 3A, the substrate holder rotates at 1rpm, the negative bias is -900V, and the bombardment time is 60min.
[0067] After glow cleaning, the vacuum was adjusted to 0.8Pa, the metal Cr target was turned on, the bias voltage was kept at -300V, the current was 75A, and it was deposited for 10min to obtain a Cr metal interface bonding layer with a thickness of 120nm.
[0068] After depositing the Cr binding layer, the bias voltage is reduced to -150V, and the N 2 , control the air pressure at 0.8Pa, the substrate temperature at 400°C, the du...
Embodiment 2
[0074] The surface of the die-casting mold made of Y10 material is polished, and the mold base is degreased, dewaxed, cleaned and dried by ultrasonic cleaning.
[0075] Place the cleaned and dried mold base in the cavity of the vacuum cathode ion plating equipment, heat to 500°C, evacuate to 5×10-3Pa, and inject Ar gas to maintain the air pressure at 1.2Pa. Turn on the ion source of the anode layer, the current is 3A, the rotation speed of the substrate holder is 1rpm, the negative bias voltage is -900V, and the bombardment time is 60min.
[0076] After glow cleaning, the vacuum was adjusted to 0.9Pa, the metal Cr target was turned on, the bias voltage was kept at -300V, the current was 80A, and the deposition time was 10min to obtain a Cr metal interface bonding layer with a thickness of 180nm.
[0077]After depositing the Cr binding layer, the bias voltage is reduced to -150V, and the N 2 , control the air pressure at 0.8Pa, the substrate temperature at 450°C, the duty cycl...
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